Sk hynix inc. (20240323527). IMAGE SENSING DEVICE simplified abstract
Contents
IMAGE SENSING DEVICE
Organization Name
Inventor(s)
Sung Wook Cho of Icheon-si (KR)
IMAGE SENSING DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240323527 titled 'IMAGE SENSING DEVICE
The patent application describes an image sensing device with multiple photoelectric conversion elements in each pixel, isolated from elements in neighboring pixels. The device includes anti-reflection layers, a light guide, and a grid layer for improved image quality.
- Image sensing device with multiple photoelectric conversion elements in each pixel
- Isolation structure to separate elements in different pixels
- Anti-reflection layers to reduce reflection and improve image quality
- Light guide to direct light to the photoelectric conversion elements
- Grid layer for further enhancement of image quality
Potential Applications: - High-resolution cameras - Medical imaging devices - Surveillance systems - Automotive cameras - Smartphone cameras
Problems Solved: - Improved image quality - Reduced reflection and glare - Enhanced sensitivity to light
Benefits: - Sharper and clearer images - Better performance in low light conditions - Reduced distortion and artifacts in images
Commercial Applications: Title: Advanced Image Sensing Technology for Enhanced Image Quality This technology can be used in various commercial applications such as high-end cameras, medical imaging equipment, surveillance systems, and smartphone cameras. The improved image quality and sensitivity to light make it a valuable innovation in the imaging industry.
Questions about Image Sensing Devices: 1. How does the isolation structure in the device contribute to image quality? The isolation structure ensures that each pixel's photoelectric conversion elements are not affected by neighboring pixels, reducing crosstalk and improving overall image quality.
2. What are the potential drawbacks of using multiple anti-reflection layers in an image sensing device? Multiple anti-reflection layers can increase manufacturing complexity and cost, but they are essential for reducing reflection and improving image quality in the device.
Original Abstract Submitted
an image sensing device includes: a plurality of photoelectric conversion elements included in a unit pixel and located in a substrate layer; an isolation structure configured to isolate the plurality of photoelectric conversion elements from photoelectric conversion elements included in another unit pixel; a first anti-reflection layer configured to overlap the plurality of photoelectric conversion elements and disposed to be in contact with one surface of the substrate layer; a light guide disposed between the plurality of photoelectric conversion elements and disposed to be in contact with one surface of the substrate layer and the first anti-reflection layer; a grid layer configured to overlap the isolation structure; and a second anti-reflection layer disposed to be in contact with the first anti-reflection layer, the light guide, and the grid layer, wherein the light guide includes a material having a refractive index smaller than a refractive index of the first anti-reflection layer.
