Samsung electronics co., ltd. (20240321921). IMAGE SENSOR INCLUDING DEVICE ISOLATION STRUCTURE simplified abstract
Contents
IMAGE SENSOR INCLUDING DEVICE ISOLATION STRUCTURE
Organization Name
Inventor(s)
Seounghyun Kim of Suwon-si (KR)
Sangchun Park of Suwon-si (KR)
Haeyeon Chung of Suwon-si (KR)
IMAGE SENSOR INCLUDING DEVICE ISOLATION STRUCTURE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240321921 titled 'IMAGE SENSOR INCLUDING DEVICE ISOLATION STRUCTURE
The abstract describes an image sensor with a device isolation structure, including a semiconductor substrate with a pixel array, first and second photoelectric conversion devices in each pixel, microlenses, and a device isolation structure between pixels and between the photoelectric conversion devices.
- The image sensor includes a semiconductor substrate with a pixel array.
- Each pixel contains a first and second photoelectric conversion device.
- Microlenses are present on the photoelectric conversion devices.
- A device isolation structure separates pixels and photoelectric conversion devices.
- The device isolation structure has an open region between the first and second photoelectric conversion devices.
- The device isolation structure includes open regions at the edges of the pixel array.
Potential Applications: - Digital cameras - Surveillance systems - Medical imaging devices
Problems Solved: - Improved image quality - Enhanced pixel isolation - Better performance in low light conditions
Benefits: - Higher resolution images - Reduced crosstalk between pixels - Enhanced overall image sensor performance
Commercial Applications: Title: "Innovative Image Sensor Technology for Enhanced Performance in Digital Cameras" This technology can be used in the development of high-quality digital cameras for professional photographers, hobbyists, and security systems, providing superior image quality and performance in various lighting conditions.
Questions about the technology: 1. How does the device isolation structure improve pixel performance? The device isolation structure helps to reduce crosstalk between pixels, resulting in higher image quality and better overall performance.
2. What are the potential market implications of this innovative image sensor technology? This technology could disrupt the digital camera market by offering enhanced image quality and performance, appealing to professional photographers and consumers looking for high-quality imaging solutions.
Original Abstract Submitted
provided is an image sensor including a device isolation structure. the image sensor includes a semiconductor substrate including a pixel array including a plurality of pixels, a first photoelectric conversion device and a second photoelectric conversion device inside the semiconductor substrate and included in each of the plurality of pixels, microlenses on the first photoelectric conversion device and the second photoelectric conversion device and a device isolation structure between the plurality of pixels and between the first photoelectric conversion device and the second photoelectric conversion device, the device isolation structure opening a part between the first photoelectric conversion device and the second photoelectric conversion device, including an open region at each edge of the plurality of pixels, and may be continuous in the pixel array.
