Samsung electronics co., ltd. (20240292604). SEMICONDUCTOR DEVICE simplified abstract
Contents
SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240292604 titled 'SEMICONDUCTOR DEVICE
The semiconductor device described in the patent application consists of a substrate with cell regions, active patterns arranged parallel to the lower surface of the substrate in two directions, intersecting on the cell regions, a shield pattern surrounding the side surfaces of the active patterns, isolation patterns between the active patterns and the shield pattern, isolation patterns between adjacent active patterns in one direction, and word lines crossing the active patterns and shield pattern in the other direction.
- Active patterns arranged parallel to the lower surface of the substrate in two directions
- Shield pattern surrounding the side surfaces of the active patterns
- Isolation patterns between the active patterns and the shield pattern
- Isolation patterns between adjacent active patterns in one direction
- Word lines crossing the active patterns and shield pattern in the other direction
Potential Applications: - Memory devices - Microprocessors - Integrated circuits
Problems Solved: - Improved performance and efficiency of semiconductor devices - Enhanced data storage capabilities - Better integration of components on a substrate
Benefits: - Increased speed and reliability of electronic devices - Higher data processing capabilities - Reduction in power consumption
Commercial Applications: Title: Advanced Semiconductor Devices for Enhanced Performance This technology can be used in various industries such as consumer electronics, telecommunications, and automotive for the development of faster and more efficient devices.
Questions about the technology: 1. How does the arrangement of active patterns on the substrate impact the performance of the semiconductor device? 2. What are the potential challenges in implementing this technology in mass production?
Original Abstract Submitted
a semiconductor device includes a substrate including cell regions, active patterns adjacent to each other in first and second directions that are parallel to a lower surface of the substrate and intersect each other on the cell regions, a shield pattern surrounding side surfaces of the active patterns, a first isolation pattern surrounding the active patterns between the active patterns and the shield pattern, second isolation patterns between adjacent active patterns in the first direction, and word lines crossing the active patterns and the shield pattern in the second direction.
