Samsung display co., ltd. (20240324311). METHOD OF MANUFACTURING DISPLAY APPARATUS simplified abstract
Contents
METHOD OF MANUFACTURING DISPLAY APPARATUS
Organization Name
Inventor(s)
Israel Esteban Lazo Martinez of Yongin-si (KR)
Sukhoon Kang of Yongin-si (KR)
METHOD OF MANUFACTURING DISPLAY APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240324311 titled 'METHOD OF MANUFACTURING DISPLAY APPARATUS
The method described in the abstract involves manufacturing a display apparatus by forming a photoresist on a substrate, irradiating the photoresist with pulse light, and curing the irradiated portion to form a bank layer. The pulse light used has a wavelength range between 250 nm and 650 nm.
- The method involves using pulse light to cure the photoresist on the substrate.
- The wavelength range of the pulse light is carefully selected for optimal curing.
- The process results in the formation of a bank layer essential for display apparatus manufacturing.
- This innovative method offers precise control over the curing process.
- The technology ensures high-quality display apparatus production.
Potential Applications: - Display manufacturing industry - Electronics industry for various devices requiring precise patterning
Problems Solved: - Precise curing of photoresist on substrates - Control over bank layer formation in display apparatus
Benefits: - Improved quality and efficiency in display manufacturing - Enhanced control over the manufacturing process - Cost-effective production method
Commercial Applications: Title: Advanced Display Manufacturing Method This technology can be applied in the display manufacturing industry to enhance production processes, improve product quality, and reduce manufacturing costs. The precise control over curing and bank layer formation makes it a valuable innovation for companies in the electronics sector.
Questions about the technology: 1. How does the wavelength range of the pulse light impact the curing process? The wavelength range of the pulse light is crucial for ensuring optimal curing of the photoresist on the substrate. It affects the depth of penetration and the efficiency of the curing process.
2. What are the advantages of using pulse light for curing in display apparatus manufacturing? Using pulse light for curing offers precise control over the process, resulting in high-quality bank layer formation essential for display apparatus production.
Original Abstract Submitted
a method of manufacturing a display apparatus includes supplying a substrate, forming a photoresist on the substrate, irradiating at least a portion of the photoresist with a pulse light including a plurality of pulses, and forming a bank layer by curing at least the portion of the photoresist irradiated with the pulse light, wherein a wavelength range of the pulse light is greater than or equal to about 250 nm and less than or equal to about 650 nm.
