Kioxia corporation (20240312803). SUBSTRATE PROCESSING DEVICE simplified abstract
Contents
SUBSTRATE PROCESSING DEVICE
Organization Name
Inventor(s)
Shusaku Matsumoto of Saitama Saitama (JP)
Koichiro Kawano of Kamakura Kanagawa (JP)
Tomoya Iwasaki of Yokkaichi Mie (JP)
SUBSTRATE PROCESSING DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240312803 titled 'SUBSTRATE PROCESSING DEVICE
The patent application describes a substrate processing device with a processing tank divided into three regions, where substrates are processed using a solution that flows between the regions. A moving body in the tank creates a flow of the solution, controlled by a movement mechanism.
- Substrate processing device with a processing tank divided into three regions
- Substrates housed in the first region and processed using a solution
- Solution flows between the first and second regions
- Moving body in the second region creates a flow of the solution
- Movement mechanism controls the moving body
Potential Applications: - Semiconductor manufacturing - Solar panel production - Flat panel display manufacturing
Problems Solved: - Efficient processing of multiple substrates - Controlled flow of processing solution
Benefits: - Increased productivity - Improved processing quality - Reduced waste of processing solution
Commercial Applications: Title: Advanced Substrate Processing Device for Semiconductor Manufacturing This technology can be used in semiconductor manufacturing facilities to enhance processing efficiency and improve overall production quality. The market implications include faster production cycles, reduced costs, and increased competitiveness in the semiconductor industry.
Questions about Substrate Processing Device: 1. How does the moving body in the processing tank improve substrate processing efficiency? The moving body creates a flow of the processing solution, ensuring uniform processing of substrates and enhancing overall productivity.
2. What are the potential cost-saving benefits of using this substrate processing device in semiconductor manufacturing? By improving processing efficiency and reducing waste of processing solution, this device can lead to significant cost savings for semiconductor manufacturers.
Original Abstract Submitted
a substrate processing device includes a processing tank including a first region, a second region, and a third region, wherein a plurality of substrates are housed in the first region and arranged in a first direction with their faces oriented in an approximately horizontal direction such that a processing of the substrates using a processing solution is carried out, the second region is provided in a vicinity of the first region, and the third region is provided such that the processing solution can move between the first region and the second region; a moving body disposed in the second region of the processing tank and configured to move such that a flow of the processing solution occurs; and a movement mechanism configured to move the moving body.
