Category:Zheng Tao

Zheng Tao

Executive Summary

Zheng Tao is an inventor who has filed 3 patents. Their primary areas of innovation include including internal interconnections, e.g. cross-under constructions {(internal lead connections (2 patents), {Making of internal connections, substrate contacts} (1 patents), to produce devices, e.g. integrated circuits, each consisting of a plurality of components (1 patents), and they have worked with companies such as IMEC VZW (3 patents). Their most frequent collaborators include (2 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• H01L23/535 (including internal interconnections, e.g. cross-under constructions {(internal lead connections): 2 patents
• H01L21/743 ({Making of internal connections, substrate contacts}): 1 patents
• H01L21/823431 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
• H01L21/823475 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
• H01L23/5286 ({Geometry or} layout of the interconnection structure {(): 1 patents
• G03F7/11 (having cover layers or intermediate layers, e.g. subbing layers {(): 1 patents
• G03F7/0035 (Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g.): 1 patents
• G03F1/38 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F1/56 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/094 (characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general): 1 patents
• H01L29/401 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H01L29/41733 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H01L29/41791 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents

Companies

List of Companies

• IMEC VZW: 3 patents

Collaborators

• Boon Teik Chan (2 collaborations)
• Efrain Altamirano Sanchez (1 collaborations)
• Anshul Gupta (1 collaborations)
• Basoene Briggs (1 collaborations)
• Waikin Li (1 collaborations)