Category:Tetsuya KAMIMURA

Tetsuya KAMIMURA

Executive Summary

Tetsuya KAMIMURA is an inventor who has filed 9 patents. Their primary areas of innovation include Stripping or agents therefor (2 patents), Other compounding ingredients of detergent compositions covered in group (2 patents), DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL (2 patents), and they have worked with companies such as FUJIFILM Corporation (9 patents). Their most frequent collaborators include (2 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• G03F7/425 (Stripping or agents therefor): 2 patents
• C11D3/0073 (Other compounding ingredients of detergent compositions covered in group): 2 patents
• C11D7/04 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 2 patents
• C11D7/20 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 2 patents
• C11D7/261 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 2 patents
• C11D7/3209 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 2 patents
• C11D7/3218 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 2 patents
• C11D7/3227 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 2 patents
• C11D7/3281 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 2 patents
• C11D7/34 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 2 patents
• C11D7/5004 ({Organic solvents}): 2 patents
• C11D7/5009 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 2 patents
• C11D7/5022 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 2 patents
• G03F7/423 ({containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds}): 2 patents
• G03F7/426 ({containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides}): 2 patents
• H01L21/02063 ({during, before or after processing of insulating layers}): 2 patents
• H01L21/02068 ({during, before or after processing of insulating layers}): 2 patents
• C11D2111/22 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 2 patents
• B01D71/56 (SEPARATION (separating solids from solids by wet methods): 2 patents
• B01D69/02 (SEPARATION (separating solids from solids by wet methods): 2 patents
• G03F7/16 (Coating processes; Apparatus therefor (applying coatings to base materials in general): 2 patents
• G03F7/325 (Liquid compositions therefor, e.g. developers): 2 patents
• G03F7/40 (Treatment after imagewise removal, e.g. baking): 2 patents
• H01L21/0274 (Making masks on semiconductor bodies for further photolithographic processing not provided for in group): 2 patents
• C11D11/0047 (Special methods for preparing compositions containing mixtures of detergents): 2 patents
• B01D61/18 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D61/20 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D71/261 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D71/262 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D71/641 (SEPARATION (separating solids from solids by wet methods): 1 patents
• G03F7/32 (Liquid compositions therefor, e.g. developers): 1 patents
• B65D25/14 (Linings or internal coatings (of containers made by folding or erecting blanks made of paper): 1 patents
• B65D85/00 (Containers, packaging elements or packages, specially adapted for particular articles or materials (): 1 patents
• B65D85/70 (CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES): 1 patents
• G03F7/30 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/322 (Liquid compositions therefor, e.g. developers): 1 patents
• H01L21/0271 ({comprising organic layers}): 1 patents
• H01L21/308 (using masks (): 1 patents
• B01D61/58 (Multistep processes): 1 patents
• B01D3/145 (Fractional distillation {or use of a fractionation or rectification column}): 1 patents
• B01D65/02 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D71/26 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D71/28 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D71/32 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D71/68 (SEPARATION (separating solids from solids by wet methods): 1 patents
• H01L21/67017 ({Apparatus for fluid treatment (): 1 patents
• B01D2311/25 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D2311/2623 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D2311/2669 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D2317/02 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D2325/022 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D2325/42 (SEPARATION (separating solids from solids by wet methods): 1 patents
• C11D3/2082 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
• C11D3/3409 (containing sulfur {(): 1 patents
• C11D3/361 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
• B01D37/04 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D19/0404 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D27/00 (Cartridge filters of the throw-away type): 1 patents
• B01D39/1676 (SEPARATION (separating solids from solids by wet methods): 1 patents
• B01D53/46 (Removing components of defined structure): 1 patents
• B01J31/00 (Catalysts comprising hydrides, coordination complexes or organic compounds (catalyst compositions used only in polymerisation reactions): 1 patents
• B01J31/063 (containing polymers {(organometallic polymers): 1 patents
• B01J47/014 (CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS): 1 patents
• B01D2257/60 (SEPARATION (separating solids from solids by wet methods): 1 patents
• G03F7/327 (Liquid compositions therefor, e.g. developers): 1 patents
• B24B37/00 (Lapping machines or devices; Accessories (): 1 patents
• G03F7/038 (Macromolecular compounds which are rendered insoluble or differentially wettable (): 1 patents
• G03F7/039 (Macromolecular compounds which are photodegradable, e.g. positive electron resists (): 1 patents
• G03F7/0392 (Macromolecular compounds which are photodegradable, e.g. positive electron resists (): 1 patents
• G03F7/0397 (Macromolecular compounds which are photodegradable, e.g. positive electron resists (): 1 patents
• G03F7/0752 (used for diffusion transfer {(): 1 patents
• G03F7/0758 (used for diffusion transfer {(): 1 patents
• G03F7/167 ({from the gas phase, by plasma deposition (): 1 patents
• G03F7/2004 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 1 patents
• G03F7/2006 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 1 patents
• H01L21/027 (Making masks on semiconductor bodies for further photolithographic processing not provided for in group): 1 patents
• H01L21/28 (Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups): 1 patents
• H01L21/304 (Mechanical treatment, e.g. grinding, polishing, cutting {(): 1 patents
• H01L21/3065 (Plasma etching; Reactive-ion etching): 1 patents
• H01L21/31116 ({by dry-etching}): 1 patents
• H01L21/32 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H01L21/3205 (Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers (manufacture of electrodes): 1 patents
• H01L21/321 (After treatment): 1 patents
• H01L21/3212 ({by chemical mechanical polishing [CMP]}): 1 patents
• H01L21/768 (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
• H01L21/76802 (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
• H01L21/76829 ({characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers}): 1 patents
• H01L21/7684 (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
• H01L21/76843 ({formed in openings in a dielectric}): 1 patents
• H01L21/76877 ({Thin films associated with contacts of capacitors}): 1 patents
• C11D3/30 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
• C11D3/2096 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
• H01L21/02065 ({during, before or after processing of insulating layers}): 1 patents

Companies

List of Companies

• FUJIFILM Corporation: 9 patents

Collaborators

• Tomonori TAKAHASHI (2 collaborations)
• Tetsuya Shimizu (2 collaborations)
• Naotsugu MURO (2 collaborations)
• Tadashi OMATSU (1 collaborations)
• Satomi TAKAHASHI (1 collaborations)
• Tetsuya SHIMIZU (1 collaborations)
• Satomi Takahashi (1 collaborations)
• Tadashi Omatsu (1 collaborations)
• Tadashi INABA (1 collaborations)
• Masahiro YOSHIDOME (1 collaborations)
• Yukihisa KAWADA (1 collaborations)
• Shimpei YAMADA (1 collaborations)
• Naoko OUCHI (1 collaborations)
• Nobuaki SUGIMURA (1 collaborations)
• Yuta SHIGENOI (1 collaborations)