Category:Jun Ki KIM

Jun Ki KIM

Executive Summary

Jun Ki KIM is an inventor who has filed 5 patents. Their primary areas of innovation include ORGANIC ELECTRIC SOLID-STATE DEVICES (3 patents), ORGANIC ELECTRIC SOLID-STATE DEVICES (2 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (2 patents), and they have worked with companies such as DUK SAN NEOLUX CO., LTD. (5 patents). Their most frequent collaborators include (5 collaborations), (5 collaborations), (5 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• H10K59/122 (ORGANIC ELECTRIC SOLID-STATE DEVICES): 3 patents
• H10K59/1201 (ORGANIC ELECTRIC SOLID-STATE DEVICES): 2 patents
• G03F7/032 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• G03F7/40 (Treatment after imagewise removal, e.g. baking): 2 patents
• H10K71/40 (ORGANIC ELECTRIC SOLID-STATE DEVICES): 1 patents
• H10K85/111 (ORGANIC ELECTRIC SOLID-STATE DEVICES): 1 patents
• C11D7/267 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
• C11D7/263 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
• C11D7/266 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
• C11D2111/16 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
• C11D2111/40 (DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL): 1 patents
• C08G63/676 (MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS): 1 patents
• C08G63/81 (MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS): 1 patents
• C08K3/04 (Use of inorganic or non-macromolecular organic substances as compounding ingredients (paints, inks, varnishes, dyes, polishes, adhesives): 1 patents
• C09D7/20 (COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics): 1 patents
• C09D7/61 (COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics): 1 patents
• C09D167/06 (COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics): 1 patents
• H10K59/173 (ORGANIC ELECTRIC SOLID-STATE DEVICES): 1 patents
• G03F7/0382 (Macromolecular compounds which are rendered insoluble or differentially wettable (): 1 patents
• G03F7/0042 ({with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists (): 1 patents
• G03F7/70 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• C08G63/672 (MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS): 1 patents
• G03F7/30 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents

Companies

List of Companies

• DUK SAN NEOLUX CO., LTD.: 5 patents

Collaborators

• Changmin LEE (5 collaborations)
• Yeon Soo LEE (5 collaborations)
• Jun BAE (5 collaborations)
• Soung Yun MUN (5 collaborations)
• Kyung Soo KIM (5 collaborations)
• Hanwook SEO (2 collaborations)
• Seo Jeong JEON (2 collaborations)
• Hyun Sang CHO (1 collaborations)
• Jae Hyun LIM (1 collaborations)
• Jaehyun LIM (1 collaborations)
• Wook SONG (1 collaborations)
• Jin Hyun KIM (1 collaborations)
• Ju Cheol KWON (1 collaborations)