Category:Eric Chih-Fang Liu of Albany NY (US)

Eric Chih-Fang Liu of Albany NY (US)

Executive Summary

Eric Chih-Fang Liu of Albany NY (US) is an inventor who has filed 9 patents. Their primary areas of innovation include {using masks} (5 patents), comprising inorganic layers (4 patents), {characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment} (3 patents), and they have worked with companies such as Tokyo Electron Limited (9 patents). Their most frequent collaborators include (4 collaborations), (3 collaborations), (3 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• H01L21/31144 ({using masks}): 5 patents
• H01L21/0332 (comprising inorganic layers): 4 patents
• H01L21/0337 ({characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment}): 3 patents
• H01L21/31111 ({by chemical means}): 2 patents
• H01L21/0338 ({Process specially adapted to improve the resolution of the mask}): 1 patents
• G03F7/0042 ({with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists (): 1 patents
• H01L21/027 (Making masks on semiconductor bodies for further photolithographic processing not provided for in group): 1 patents
• G03F7/70033 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70733 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• H01J37/32743 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J37/32899 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J2237/334 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
• H01L21/76802 (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
• H01L21/0276 ({using an anti-reflective coating (anti-reflective coating for lithography in general): 1 patents
• H01L21/32139 ({using masks}): 1 patents
• H01L21/31055 ({the removal being a chemical etching step, e.g. dry etching (etching per se): 1 patents
• H01L21/7682 (Applying interconnections to be used for carrying current between separate components within a device {comprising conductors and dielectrics}): 1 patents
• H01L21/76819 ({Smoothing of the dielectric (planarisation of insulating materials per se): 1 patents
• H01L21/76831 ({in via holes or trenches, e.g. non-conductive sidewall liners}): 1 patents
• H01L21/0271 ({comprising organic layers}): 1 patents
• H01L21/31116 ({by dry-etching}): 1 patents

Companies

List of Companies

• Tokyo Electron Limited: 9 patents

Collaborators

• Steven Grzeskowiak of Albany NY (US) (4 collaborations)
• Shan Hu of Albany NY (US) (3 collaborations)
• Henan Zhang of Albany NY (US) (3 collaborations)
• Sangita Kumari of Albany NY (US) (3 collaborations)
• Peter Delia of Albany NY (US) (3 collaborations)
• Katie Lutker-Lee of Albany NY (US) (2 collaborations)
• David L. O'Meara of Albany NY (US) (2 collaborations)
• Alexandra Krawicz of Albany NY (US) (1 collaborations)
• Shihsheng Chang of Albany NY (US) (1 collaborations)
• Kai-Hung Yu of Albany NY (US) (1 collaborations)
• Yun Han of Albany NY (US) (1 collaborations)
• Jodi Grzeskowiak of Schenectady NY (US) (1 collaborations)
• Jeffrey Smith of Albany NY (US) (1 collaborations)
• Christopher Cole of Albany NY (US) (1 collaborations)
• Xinghua Sun of Albany NY (US) (1 collaborations)
• Daniel Santos Rivera of Albany NY (US) (1 collaborations)