ASML NETHERLANDS B.V. Patent Application Trends in 2024
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Contents
ASML NETHERLANDS B.V. Patent Filing Activity
ASML NETHERLANDS B.V. patent applications in 2024
Top 10 Technology Areas
- G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 26 patents
- Example: 20240231065. DARK FIELD MICROSCOPE simplified abstract (ASML NETHERLANDS B.V.)
- G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 20 patents
- Example: 20240231065. DARK FIELD MICROSCOPE simplified abstract (ASML NETHERLANDS B.V.)
- H01J37/28 (with scanning beams {()
- H01J37/244 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps)
- G03F7/705 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 13 patents
- Example: 20240126181. PROCESS WINDOW BASED ON DEFECT PROBABILITY simplified abstract (ASML NETHERLANDS B.V.)
- G06T2207/30148 (Subject of image; Context of image processing)
- G06T2207/10061 (Image acquisition modality)
- G03F7/706839 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- G03F9/7088 ({for microlithography (measuring printed patterns for monitoring overlay)
- Count: 8 patents
- Example: 20240231247. METROLOGY METHOD AND APPARATUS simplified abstract (ASML Netherlands B.V.)
- G03F7/7065 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
Emerging Technology Areas
- G06V10/776 (IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING)
- G06F18/214 (Generating training patterns; Bootstrap methods, e.g. bagging or boosting)
- G06T7/0006 ({using a design-rule based approach})
- G06V10/774 (IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING)
- G06F2111/06 (ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models)
- G03F7/2004 (Exposure; Apparatus therefor (photographic printing apparatus for making copies)
- G03F7/70583 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- G01N2223/3307 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms)
- G01N23/2206 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms)
- G01B11/24 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS)
Top Inventors
- Patrick Sebastian UEBEL (9 patents)
- Sebastianus Adrianus GOORDEN (8 patents)
- Weiming REN of San Jose CA (US) (6 patents)
- Xuedong LIU of San Jose CA (US) (6 patents)
- Marco Jan-Jaco WIELAND (6 patents)
- Simon Gijsbert Josephus MATHIJSSEN (6 patents)
- Arie Jeffrey DEN BOEF (6 patents)
- Maxim PISARENCO (5 patents)
- Wim Tjibbo TEL (5 patents)
- Xuerang HU of San Jose CA (US) (5 patents)
Patent Categories
Geographical Distribution of Inventors
Geographical Distribution of US Inventors
Categories:
- ASML NETHERLANDS B.V.
- Companies
- CPC G02B21/0016
- CPC G01N21/9501
- CPC G02B21/002
- CPC G02B21/0036
- CPC G02B21/02
- CPC G02B21/10
- CPC G03F7/70625
- CPC G03F7/70633
- CPC G03F7/706849
- CPC G03F7/706851
- CPC G01N21/95623
- CPC G02B27/0927
- CPC G02B27/0944
- CPC G02B27/0994
- CPC G03F7/20
- CPC H01L22/10
- CPC G03F7/70508
- CPC G03F1/84
- CPC G03F7/7065
- CPC G03F7/70616
- CPC G03F9/7088
- CPC G03F9/7046
- CPC G06V10/24
- CPC G06T11/00
- CPC H01J37/141
- CPC H01J37/28
- CPC H01J37/145
- CPC H01L21/68721
- CPC G03F7/70708
- CPC H01L21/67028
- CPC H01L21/6833
- CPC H01L31/115
- CPC H01J37/244
- CPC H01J2237/2441
- CPC G03F7/705
- CPC G03F7/70558
- CPC G03F7/706839
- CPC G03F7/70441
- CPC G06F30/392
- CPC H01J37/12
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- CPC H01J2237/2448
- CPC H01J37/1474
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- CPC H01J2237/1536
- CPC H01J37/045
- CPC H01J37/3177
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- CPC G03F7/70858
- CPC G03F7/70033
- CPC H05G2/008
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- CPC C01B32/174
- CPC B01J19/121
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- CPC G03F1/62
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- CPC G01N2201/0612
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- CPC G03F7/70516
- CPC G03F7/70025
- CPC G01N21/956
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- CPC G03F9/7084
- CPC G05B13/027
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- CPC H01J37/24
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- CPC G03F7/7085
- CPC G03F7/70891
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- CPC G03F7/70666
- CPC G06F30/30
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- CPC G02B21/365
- CPC G03H1/0866
- CPC G03H2001/0038
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- CPC G03H2001/0473
- CPC G03H2210/62
- CPC H05G2/006
- CPC C03B37/15
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- CPC G02B6/02347
- CPC G03F9/7065
- CPC C03B2203/16
- CPC C03B2203/42
- CPC B81B7/02
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- CPC B81B2207/015
- CPC G03F7/70191
- CPC G03F1/82
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- CPC G03F7/70575
- CPC G02B5/208
- CPC G02B5/283
- CPC G03F7/2043
- CPC G03F7/70283
- CPC G03F7/706
- CPC G02F1/3523
- CPC G03F7/70041
- CPC G02F1/353
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- CPC G02F1/3507
- CPC H05G2/00
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- CPC G02B27/646
- CPC G01N2201/063
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- CPC G06T7/13
- CPC G06T5/002
- CPC G06T2207/20192
- CPC G06T2207/20084
- CPC G06T2207/10061
- CPC G06T5/10
- CPC G06T5/50
- CPC H01J37/222
- CPC G06T2207/20056
- CPC H01J2237/223
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- CPC H01J2237/0206
- CPC H01J2237/0475
- CPC H01J37/09
- CPC G02B27/0025
- CPC G03F7/168
- CPC G03F7/70266
- CPC G03F7/70325
- CPC H04N1/2166
- CPC G01M11/0242
- CPC G01K1/026
- CPC G03F7/702
- CPC G03F7/70208
- CPC H01L21/67288
- CPC H01J2237/2001
- CPC H01J2237/2814
- CPC H01J37/265
- CPC H01J2237/1207
- CPC G02B26/0816
- CPC G02B27/0977
- CPC G02F1/3532
- CPC G02F1/3536
- CPC G02F1/392
- CPC G02F1/395
- CPC G02F2202/32
- CPC G03F1/64
- CPC G05B19/41875
- CPC G03F1/44
- CPC G05B19/41885
- CPC G05B2219/45031
- CPC H01J37/1472
- CPC G03F7/70655
- CPC G01N2223/646
- CPC G03F7/70608
- CPC G01B11/02
- CPC G03F7/706843
- CPC G03F9/7092
- CPC G06T5/80
- CPC G06T7/33
- CPC H01J2237/2809
- CPC G06T7/60
- CPC G06T2207/30144
- CPC G06V10/22
- CPC G06V20/698
- CPC G06T2207/20076
- CPC G06V10/762
- CPC G06T7/11
- CPC G06V10/44
- CPC G06V10/761
- CPC B08B7/04
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- CPC B08B17/02
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- CPC H01J2237/006
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- CPC G03F7/7075
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- CPC G06T7/593
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- CPC H01J37/05
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- CPC F16F15/08
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- CPC G03F7/709
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- CPC G01B9/02003
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- CPC G21K1/10
- CPC G03F7/707
- CPC G03F7/70816
- CPC G01B9/02062
- CPC G01B11/161
- CPC G03F7/706841
- CPC G02B27/48
- CPC H01S3/225
- CPC G03F7/70933
- CPC G03F7/70833
- CPC H01J2237/2446
- CPC G06N20/20
- CPC H01J37/26
- CPC H01J2237/0213
- CPC H01J2237/0262
- CPC H01J2237/038
- CPC H01J2237/20235
- CPC H01J37/226
- CPC H01J2237/2482
- CPC G06T3/40
- CPC G06T7/50
- CPC G06T7/62
- CPC G06T7/70
- CPC G06V10/764
- CPC G03F7/2041
- CPC G03F7/70733
- CPC G03F7/70991
- CPC G03F7/70875
- CPC G03F7/70808
- CPC H05G2/005
- CPC G03F7/70658
- CPC G01N29/04
- CPC G01N29/262
- CPC G01N29/28
- CPC G01N2291/023
- CPC G01N2291/106
- CPC H05G2/003
- CPC H01J37/21
- CPC H01J2237/036
- CPC H01J2237/151
- CPC H01J2237/216
- CPC H01J2237/221
- CPC H01J2237/24592
- CPC H01J37/1471
- CPC G03F7/70675
- CPC H01J2237/0048
- CPC G03F7/70091
- CPC B23K26/354
- CPC B23K26/342
- CPC G03F7/70416
- CPC B22F10/00
- CPC B22F10/20
- CPC B23Q3/18
- CPC G03F7/70716
- CPC B05D3/06
- CPC B05D5/00
- CPC B33Y10/00
- CPC B33Y80/00
- CPC B22F7/062
- CPC G03F7/708
- CPC B22F10/25
- CPC G03F1/38
- CPC H01J2237/028
- CPC G01B11/24
- CPC G01N23/2206
- CPC G01N23/203
- CPC G01N2223/3307
- CPC G03F7/70583
- CPC G03F7/2004
- CPC G06F2111/06
- CPC G06V10/774
- CPC G06T7/0006
- CPC G06F18/214
- CPC G06V10/776
- Patent Trends by Company in 2024
