ACM RESEARCH (SHANGHAI), INC. Patent Application Trends in 2024
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ACM RESEARCH (SHANGHAI), INC. Patent Filing Activity
ACM RESEARCH (SHANGHAI), INC. patent applications in 2024
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Top 10 Technology Areas
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- C25D17/001 ({Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells})
- Count: 3 patents
- Example: 20240018681. PLATING APPARATUS AND PLATING METHOD simplified abstract (ACM RESEARCH (SHANGHAI), INC.)
- C25D21/12 (Process control or regulation (controlling or regulating in general)
- Count: 3 patents
- Example: 20240018681. PLATING APPARATUS AND PLATING METHOD simplified abstract (ACM RESEARCH (SHANGHAI), INC.)
- C25D17/002 ({Cell separation, e.g. membranes, diaphragms})
- Count: 2 patents
- Example: 20240018681. PLATING APPARATUS AND PLATING METHOD simplified abstract (ACM RESEARCH (SHANGHAI), INC.)
- C25D21/10 (Agitating of electrolytes; Moving of racks)
- C25D7/12 (Semiconductors)
- Count: 2 patents
- Example: 20240026561. PLATING APPARATUS AND PLATING METHOD simplified abstract (ACM RESEARCH (SHANGHAI), INC.)
- H01L21/68764 (using mechanical means, e.g. chucks, clamps or pinches {(using elecrostatic chucks)
- Count: 1 patents
- Example: 20240105496. SUBSTRATE SUPPORTING APPARATUS simplified abstract (ACM RESEARCH (SHANGHAI), INC.)
- H01L21/6708 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se)
- Count: 1 patents
- Example: 20240105496. SUBSTRATE SUPPORTING APPARATUS simplified abstract (ACM RESEARCH (SHANGHAI), INC.)
- H01L21/6715 ({Apparatus for applying a liquid, a resin, an ink or the like ()
- Count: 1 patents
- Example: 20240105496. SUBSTRATE SUPPORTING APPARATUS simplified abstract (ACM RESEARCH (SHANGHAI), INC.)
- H01L21/68735 (using mechanical means, e.g. chucks, clamps or pinches {(using elecrostatic chucks)
- Count: 1 patents
- Example: 20240105496. SUBSTRATE SUPPORTING APPARATUS simplified abstract (ACM RESEARCH (SHANGHAI), INC.)
- H01L21/68742 (using mechanical means, e.g. chucks, clamps or pinches {(using elecrostatic chucks)
- Count: 1 patents
- Example: 20240105496. SUBSTRATE SUPPORTING APPARATUS simplified abstract (ACM RESEARCH (SHANGHAI), INC.)
Emerging Technology Areas
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- H01L21/2885 (from a liquid, e.g. electrolytic deposition)
- Count: 1 patents
- Example: 20240026561. PLATING APPARATUS AND PLATING METHOD simplified abstract (ACM RESEARCH (SHANGHAI), INC.)
- C25D17/10 (Electrodes {, e.g. composition, counter electrode})
- Count: 1 patents
- Example: 20240026561. PLATING APPARATUS AND PLATING METHOD simplified abstract (ACM RESEARCH (SHANGHAI), INC.)
- C25D17/005 ({Contacting devices})
- C25D17/06 (PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR)
- C25D7/123 ({Semiconductors first coated with a seed layer or a conductive layer})
- Count: 1 patents
- Example: 20240018681. PLATING APPARATUS AND PLATING METHOD simplified abstract (ACM RESEARCH (SHANGHAI), INC.)
- C25D5/18 (PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR)
- Count: 1 patents
- Example: 20240018681. PLATING APPARATUS AND PLATING METHOD simplified abstract (ACM RESEARCH (SHANGHAI), INC.)
- F04B23/04 (POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS (machines for liquids, or pumps, of rotary-piston or oscillating-piston type)
- B08B2203/007 (CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL (brushes)
- H01L21/67253 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se)
- H01L21/67092 ({Apparatus for mechanical treatment (or grinding or cutting, see the relevant groups in subclasses)
Top Inventors
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- Hui Wang (8 patents)
- Jian Wang (6 patents)
- Hongchao Yang (4 patents)
- Zhaowei Jia (4 patents)
- Shena Jia (2 patents)
- Fuping Chen (2 patents)
- Jun Wang (2 patents)
- Yinuo Jin (2 patents)
- Feng Liu (1 patent)
- Xiaofeng Tao (1 patent)
Patent Categories
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Geographical Distribution of Inventors
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Geographical Distribution of US Inventors
ACM RESEARCH (SHANGHAI), INC. Inventor States 2024 - Up to June 2024
Categories:
- Pages with broken file links
- ACM RESEARCH (SHANGHAI), INC.
- Companies
- CPC H01L21/68764
- CPC H01L21/6708
- CPC H01L21/6715
- CPC H01L21/68735
- CPC H01L21/68742
- CPC G03F7/7075
- CPC G03F7/168
- CPC G03F7/70533
- CPC G03F7/70825
- CPC G03F7/70933
- CPC B01D19/0036
- CPC B01D19/00
- CPC B01D19/0031
- CPC B08B3/041
- CPC B08B3/08
- CPC B08B3/10
- CPC B08B3/12
- CPC B08B7/04
- CPC F04B15/04
- CPC F04B23/00
- CPC H01L21/02052
- CPC H01L21/02057
- CPC H01L21/67017
- CPC H01L21/67051
- CPC H01L21/67092
- CPC H01L21/67253
- CPC B08B2203/007
- CPC F04B23/04
- CPC C25D5/18
- CPC C25D7/123
- CPC C25D17/001
- CPC C25D17/002
- CPC C25D21/12
- CPC C25D17/06
- CPC C25D17/005
- CPC C25D21/10
- CPC C25D17/10
- CPC C25D7/12
- CPC H01L21/2885
- Patent Trends by Company in 2024
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