18755485. FILM FORMING SYSTEM, METHOD FOR CONTROLLING FILM FORMING SYSTEM, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
Contents
FILM FORMING SYSTEM, METHOD FOR CONTROLLING FILM FORMING SYSTEM, AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
Takeshi Yamamoto of Kanagawa (JP)
FILM FORMING SYSTEM, METHOD FOR CONTROLLING FILM FORMING SYSTEM, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18755485 titled 'FILM FORMING SYSTEM, METHOD FOR CONTROLLING FILM FORMING SYSTEM, AND ARTICLE MANUFACTURING METHOD
Simplified Explanation: The patent application describes a film forming system that includes a conveyance carrier moving along a conveyance path, holding a substrate and a mask. The mask shields a non-formation area on the substrate, while a film formation unit forms a film on the film formation area of the substrate.
Key Features and Innovation:
- Conveyance carrier holds substrate and mask, moving along a conveyance path.
- Mask shields non-formation area on the substrate.
- Film formation unit forms a film on the film formation area of the substrate.
- Conveyance unit moves the carrier in intersecting directions.
- Mask supply unit supplies the carrier with the mask.
Potential Applications: This technology could be used in industries requiring precise film formation on substrates, such as semiconductor manufacturing, display panel production, and optical coatings.
Problems Solved: The system addresses the need for accurate film formation on specific areas of substrates while protecting other areas from unwanted film deposition.
Benefits:
- Enables precise film formation on substrates.
- Increases efficiency in manufacturing processes.
- Reduces material waste by targeting specific film formation areas.
Commercial Applications: The technology could be valuable in industries like electronics, optics, and automotive, where controlled film deposition is crucial for product performance and quality.
Prior Art: Readers can explore prior patents related to film forming systems, conveyance carriers, and mask supply units to understand the evolution of this technology.
Frequently Updated Research: Stay informed about advancements in film forming systems, substrate handling technologies, and mask design for improved film deposition processes.
Questions about Film Forming Systems: 1. What are the key components of a film forming system? 2. How does the mask supply unit contribute to the efficiency of the film formation process?
Original Abstract Submitted
A film forming system includes a conveyance carrier configured to hold a substrate and a mask and move inside a conveyance path, the substrate including a film formation area, the mask being configured to shield a film non-formation area other than the film formation area, a conveyance unit disposed on the conveyance path and configured to move the conveyance carrier in a first direction and a second direction intersecting the first direction, a film formation unit located along the conveyance path and configured to form a film on the film formation area of the substrate, and a mask supply unit located along the conveyance path and configured to supply the conveyance carrier with the mask.
