18734037. IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
Contents
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18734037 titled 'IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
Simplified Explanation: The patent application describes an imprint apparatus that minimizes contamination by using two irradiation units to cure an imprint material on a substrate with light and then irradiate the peripheral region of the pattern portion of the mold.
- Uses two irradiation units for curing imprint material and irradiating mold.
- Minimizes contamination in the apparatus.
- Cures imprint material on a substrate with light.
- Irradiates the peripheral region of the pattern portion of the mold.
Potential Applications: This technology can be used in the manufacturing industry for producing high-quality imprints on various substrates. It can also be applied in the semiconductor industry for creating intricate patterns on semiconductor wafers.
Problems Solved: The technology addresses the issue of contamination in imprint apparatus caused by uncured materials, ensuring a clean and efficient manufacturing process. It also improves the quality of imprints by providing precise curing of the imprint material.
Benefits: - Minimized contamination in the apparatus - Improved quality of imprints - Efficient and precise curing process - Suitable for various substrates and industries
Commercial Applications: The technology can be commercially used in the manufacturing of electronic devices, optical components, and microelectronics. It can also be applied in research institutions for prototyping and development of new products.
Questions about Imprint Apparatus: 1. How does the two-irradiation unit system help minimize contamination in the imprint apparatus? 2. What are the specific industries that can benefit from this technology?
Frequently Updated Research: Ongoing research in this field focuses on optimizing the curing process for different types of imprint materials and substrates. Researchers are also exploring the scalability of the technology for mass production applications.
Original Abstract Submitted
An imprint apparatus in which contamination in an apparatus due to an uncured material or the like can be minimized is provided. The imprint apparatus includes: a first irradiation unit configured to irradiate an imprint material on a substrate with light for performing curing in a state in which the imprint material is brought into contact with a pattern portion having a concave and convex pattern formed in a mold; and a second irradiation unit configured to irradiate a peripheral region of the pattern portion of the mold after the irradiation of the light using the first irradiation unit.
