18674889. SEMICONDUCTOR DEVICE simplified abstract (UNITED MICROELECTRONICS CORP.)

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SEMICONDUCTOR DEVICE

Organization Name

UNITED MICROELECTRONICS CORP.

Inventor(s)

Chih-Wei Kuo of Tainan City (TW)

Chia-Chang Hsu of Kaohsiung City (TW)

SEMICONDUCTOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18674889 titled 'SEMICONDUCTOR DEVICE

The semiconductor device described in the abstract includes an array region on a substrate, surrounded by a ring of dummy pattern with a gap between the array region and the ring.

  • The ring of dummy pattern also includes a ring of magnetic tunneling junction (MTJ) pattern and a ring of metal interconnect pattern overlapping the ring of MTJ.
  • The innovation involves the specific layout of the array region and the surrounding dummy patterns to enhance the functionality of the semiconductor device.

Potential Applications:

  • This technology can be applied in the manufacturing of advanced semiconductor devices for various electronic applications.
  • It can be used in the development of high-performance computing systems and memory devices.

Problems Solved:

  • The design addresses the need for improved performance and functionality in semiconductor devices.
  • It provides a solution for optimizing the layout and structure of the array region in relation to the surrounding patterns.

Benefits:

  • Enhanced performance and efficiency in semiconductor devices.
  • Improved integration of different patterns for better functionality.

Commercial Applications:

  • The technology can be utilized in the production of next-generation electronic devices.
  • It has implications for the semiconductor industry in terms of advancing device capabilities and performance.

Prior Art:

  • Researchers can explore existing patents and publications related to semiconductor device layouts and structures for further insights into this technology.

Frequently Updated Research:

  • Stay informed about the latest developments in semiconductor device design and layout optimization for ongoing advancements in the field.

Questions about Semiconductor Device Layout Optimization: 1. How does the ring of dummy pattern contribute to the overall functionality of the semiconductor device? 2. What are the potential challenges in implementing this innovative layout design in semiconductor manufacturing processes?


Original Abstract Submitted

A semiconductor device includes an array region defined on a substrate, a ring of dummy pattern surrounding the array region, and a gap between the array region and the ring of dummy pattern. Preferably, the ring of dummy pattern further includes a ring of magnetic tunneling junction (MTJ) pattern surrounding the array region and a ring of metal interconnect pattern overlapping the ring of MTJ and surrounding the array region.

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