18589750. SUBSTRATE PROCESSING DEVICE simplified abstract (Kioxia Corporation)
Contents
SUBSTRATE PROCESSING DEVICE
Organization Name
Inventor(s)
Shusaku Matsumoto of Saitama Saitama (JP)
Koichiro Kawano of Kamakura Kanagawa (JP)
Tomoya Iwasaki of Yokkaichi Mie (JP)
SUBSTRATE PROCESSING DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18589750 titled 'SUBSTRATE PROCESSING DEVICE
The patent application describes a substrate processing device with a processing tank divided into three regions for housing and processing substrates using a processing solution.
- The first region of the processing tank houses a plurality of substrates arranged horizontally for processing.
- The second region, located near the first region, facilitates the movement of the processing solution.
- The third region allows the processing solution to flow between the first and second regions.
- A moving body in the second region induces a flow of the processing solution.
- A movement mechanism controls the movement of the moving body.
Potential Applications: - Semiconductor manufacturing - Solar panel production - LCD screen fabrication
Problems Solved: - Efficient processing of multiple substrates simultaneously - Uniform distribution of processing solution - Reduced processing time and cost
Benefits: - Increased productivity - Improved quality of processed substrates - Cost savings in manufacturing processes
Commercial Applications: Title: Advanced Substrate Processing Device for Semiconductor Manufacturing This technology can be used in semiconductor manufacturing facilities to enhance production efficiency and quality control. The market implications include faster turnaround times, reduced production costs, and improved product performance.
Questions about the technology: 1. How does the moving body in the second region improve the processing of substrates? The moving body induces a flow of the processing solution, ensuring uniform distribution and efficient processing of the substrates.
2. What are the key advantages of using a substrate processing device with multiple regions? Having multiple regions allows for simultaneous processing of multiple substrates, leading to increased productivity and cost savings in manufacturing processes.
Original Abstract Submitted
A substrate processing device includes a processing tank including a first region, a second region, and a third region, wherein a plurality of substrates are housed in the first region and arranged in a first direction with their faces oriented in an approximately horizontal direction such that a processing of the substrates using a processing solution is carried out, the second region is provided in a vicinity of the first region, and the third region is provided such that the processing solution can move between the first region and the second region; a moving body disposed in the second region of the processing tank and configured to move such that a flow of the processing solution occurs; and a movement mechanism configured to move the moving body.
