18511000. SEMICONDUCTOR DEVICES simplified abstract (Samsung Electronics Co., Ltd.)
Contents
SEMICONDUCTOR DEVICES
Organization Name
Inventor(s)
SEMICONDUCTOR DEVICES - A simplified explanation of the abstract
This abstract first appeared for US patent application 18511000 titled 'SEMICONDUCTOR DEVICES
The semiconductor device described in the patent application features a first active pattern protruding from a substrate and extending parallel to the substrate's upper surface, with first and second recesses intersecting the first active pattern in a direction perpendicular to its extension. The device includes a first gate structure in the first recess and a second gate structure in the second recess, each comprising gate oxide layers, gate patterns, and capping patterns. Additionally, there are first and second metal liner patterns surrounding portions of the active pattern's sidewalls and directly contacting the gate patterns' sidewalls.
- The semiconductor device includes a unique design with active patterns protruding from the substrate and gate structures in intersecting recesses.
- The gate structures consist of gate oxide layers, gate patterns, and capping patterns for precise control of the device's operation.
- Metal liner patterns are strategically placed to enhance the device's performance by surrounding and directly contacting specific sidewalls.
Potential Applications: - This technology can be applied in the manufacturing of advanced semiconductor devices for various electronic applications. - It can be utilized in the development of high-performance integrated circuits and microprocessors.
Problems Solved: - Provides improved control and efficiency in semiconductor device operation. - Enhances the performance and reliability of electronic devices.
Benefits: - Increased precision and control in semiconductor device operation. - Enhanced performance and reliability of electronic devices utilizing this technology.
Commercial Applications: Title: Advanced Semiconductor Device Technology for Enhanced Performance This technology can be commercialized in the semiconductor industry for the production of high-performance electronic devices, leading to improved efficiency and reliability in various applications.
Questions about Semiconductor Device Technology: 1. How does the unique design of the semiconductor device contribute to its performance? - The design of the semiconductor device, with active patterns and intersecting gate structures, allows for precise control and enhanced efficiency in operation. 2. What are the potential applications of this technology beyond semiconductor devices? - This technology can potentially be applied in various electronic devices requiring high performance and reliability.
Original Abstract Submitted
A semiconductor device includes a first active pattern protruding from a substrate and extending in a first direction parallel to an upper surface of the substrate; first and second recesses crossing the first active pattern in a second direction perpendicular to the first direction; a first gate structure in the first recess, and including a first gate oxide layer, a first gate pattern and a first capping pattern; a second gate structure in the second recess, and including a second gate oxide layer, a second gate pattern and a second capping pattern; a first metal liner pattern surrounding a portion of a sidewall of the first active pattern, and directly contacting a sidewall of the first gate pattern; and a second metal liner pattern surrounding a portion of the sidewall of the first active pattern, and directly contacting a sidewall of the second gate pattern.
