18501672. OPTICAL SENSOR FOR FILM THICKNESS MEASUREMENT (Tokyo Electron Limited)
Contents
OPTICAL SENSOR FOR FILM THICKNESS MEASUREMENT
Organization Name
Inventor(s)
Ivan Maleev of Fremont CA (US)
Holger Tuitje of Fremont CA (US)
Basanta Bhaduri of Fremont CA (US)
Ching Ling Meng of Sunnyvale CA (US)
Xinkang Tian of Fremont CA (US)
OPTICAL SENSOR FOR FILM THICKNESS MEASUREMENT
This abstract first appeared for US patent application 18501672 titled 'OPTICAL SENSOR FOR FILM THICKNESS MEASUREMENT
Original Abstract Submitted
A method of film thickness measurement includes illuminating a top layer of a sample in a first region with a broadband illumination beam. The sample includes a substrate and a plurality of semiconductor structures formed between the substrate and the top layer. A first reflectivity spectrum of the sample is obtained in the first region. A first thickness of the top layer in the first region is determined by applying a top-layer model to the first reflectivity spectrum. The top-layer model is substantially unaffected by the plurality of semiconductor structures.
