18415754. SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18415754 titled 'SEMICONDUCTOR DEVICE
The semiconductor device described in the patent application includes an active pattern on a substrate, a bit line structure, spacer structures, lower and upper contact plugs, and conductive patterns.
- The active pattern is located on the substrate.
- The bit line structure is positioned on a central portion of the active pattern.
- Spacer structures are placed on the sidewalls of the bit line structure.
- Lower contact plugs are situated on opposite end portions of the active pattern.
- Upper contact plugs are located on the lower contact plugs and include a conductive pattern covered by a conductive spacer.
Potential Applications: - This technology can be used in the manufacturing of advanced semiconductor devices. - It can improve the performance and efficiency of integrated circuits.
Problems Solved: - Enhances the connectivity and functionality of semiconductor devices. - Provides a more reliable and stable structure for electronic components.
Benefits: - Increased speed and performance of electronic devices. - Improved durability and longevity of semiconductor components.
Commercial Applications: Title: Advanced Semiconductor Device Technology for Enhanced Performance This technology can be utilized in the production of high-speed processors, memory chips, and other electronic devices. It can benefit industries such as telecommunications, computing, and consumer electronics.
Questions about the technology: 1. How does this semiconductor device technology improve the efficiency of electronic devices? 2. What are the specific advantages of using conductive patterns and spacer structures in semiconductor devices?
Frequently Updated Research: Stay updated on the latest advancements in semiconductor manufacturing techniques and materials to further enhance the performance of this technology.
Original Abstract Submitted
A semiconductor device includes an active pattern on a substrate; a bit line structure on a central portion of the active pattern; a first spacer structure and a second spacer structure disposed on a first sidewall and a second sidewall, respectively, of the bit line structure, the first sidewall and the second sidewall of the bit line structure facing each other in the first direction; a lower contact plug on each of opposite end portions of the active pattern; and an upper contact plug on the lower contact plug. The upper contact plug may include a conductive pattern; and a conductive spacer covering a lower surface of the conductive pattern, wherein the conductive spacer contacts an outer sidewall of the first spacer structure, and does not contact an outer sidewall of the second spacer structure.
