18411028. SEMICONDUCTOR DEVICE simplified abstract (Japan Display Inc.)
Contents
SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
Toshinari Sasaki of Tokyo (JP)
Marina Mochizuki of Tokyo (JP)
SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18411028 titled 'SEMICONDUCTOR DEVICE
Simplified Explanation:
This patent application describes a semiconductor device with a unique structure involving multiple transparent conductive layers with different crystallizability.
- The semiconductor device includes an oxide semiconductor layer with a polycrystalline structure.
- It features a gate electrode facing the oxide semiconductor layer and a gate insulating layer between them.
- A first transparent conductive layer is connected to the oxide semiconductor layer.
- A second transparent conductive layer is in the same layer as the first but has different crystallizability.
Key Features and Innovation:
- Unique structure with multiple transparent conductive layers.
- Different crystallizability of the first and second transparent conductive layers.
- Polycrystalline structure of the oxide semiconductor layer.
Potential Applications:
This technology could be used in advanced semiconductor devices, display technologies, and integrated circuits.
Problems Solved:
- Enhancing the performance and efficiency of semiconductor devices.
- Improving the conductivity and crystalline properties of transparent conductive layers.
Benefits:
- Increased functionality and reliability of semiconductor devices.
- Enhanced transparency and conductivity in display technologies.
- Improved integration and performance in integrated circuits.
Commercial Applications:
Potential commercial applications include the manufacturing of high-performance electronic devices, advanced displays, and cutting-edge integrated circuits.
Questions about Semiconductor Devices:
1. How does the different crystallizability of the transparent conductive layers impact the overall performance of the semiconductor device?
The different crystallizability of the transparent conductive layers allows for optimized conductivity and transparency, leading to improved device performance.
2. What are the potential challenges in manufacturing semiconductor devices with multiple transparent conductive layers of varying crystallizability?
The main challenge lies in ensuring uniformity and consistency in the crystalline properties of the layers during the manufacturing process to maintain device reliability and performance.
Original Abstract Submitted
A semiconductor device includes an oxide semiconductor layer including a polycrystalline structure, a gate electrode facing the oxide semiconductor layer, a gate insulating layer between the oxide semiconductor layer and the gate electrode, a first transparent conductive layer connected to the oxide semiconductor layer, and a second transparent conductive layer arranged in the same layer as the first transparent conductive layer and separated from the first transparent conductive layer, wherein crystallizability of the first transparent conductive layer is different from crystallizability of the second transparent conductive layer.
