18402814. SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
Organization Name
Inventor(s)
Hideharu Itatani of Toyama-shi (JP)
Naofumi Ohashi of Toyama-shi (JP)
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18402814 titled 'SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
The patent application describes a technique involving a process chamber, a boat for supporting a substrate, a revolution part with boat supports, a delivery chamber with different areas, a cooler, and a controller for operation control.
- Process chamber for substrate processing, including heating.
- Boat to support the substrate during processing.
- Revolution part with boat supports to revolve the boat.
- Delivery chamber with multiple areas for substrate handling.
- Cooler for cooling the substrate after the heating process.
- Controller for controlling the revolution and movement operations.
Potential Applications: - Semiconductor manufacturing - Thin film deposition processes - Solar cell production
Problems Solved: - Efficient substrate processing - Controlled heating and cooling processes - Streamlined substrate handling
Benefits: - Improved process efficiency - Enhanced substrate quality - Reduced processing time
Commercial Applications: Title: "Advanced Substrate Processing System for Semiconductor Manufacturing" This technology can be used in semiconductor manufacturing facilities to optimize substrate processing, improve product quality, and increase production efficiency.
Prior Art: Researchers can explore prior patents related to substrate processing systems, semiconductor manufacturing equipment, and substrate handling technologies to understand the existing landscape in this field.
Frequently Updated Research: Researchers can stay updated on advancements in substrate processing systems, semiconductor manufacturing technologies, and cooling processes to enhance their understanding of the latest developments in the industry.
Questions about Substrate Processing Systems: 1. How does this technology improve substrate processing efficiency? - The technology streamlines substrate handling, heating, and cooling processes, leading to enhanced efficiency and productivity.
2. What are the potential applications of this substrate processing system beyond semiconductor manufacturing? - The system can be adapted for various industries requiring precise substrate processing, such as thin film deposition and solar cell production.
Original Abstract Submitted
A technique includes a process chamber where a substrate-processing process including a heating process to a substrate is capable of being performed, a boat configured to support the substrate, a revolution part including a plurality of boat supports configured to support the boat, and capable of revolving the boat supports, a delivery chamber including a first area arranged below the process chamber, a second area where the substrate after the heating process is capable of waiting, and a third area where the substrate is capable of being delivered to and from an adjacent transfer chamber, among areas above the revolution part, a cooler capable of performing a cooling process to the substrate in the second area, and a controller capable of controlling a revolution operation or a movement operation.
