18397308. PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSURE APPARATUS simplified abstract (Nikon Corporation)
Contents
PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSURE APPARATUS
Organization Name
Inventor(s)
Masaki Kato of Yokohama-shi (JP)
Yasushi Mizuno of Saitama-shi (JP)
Toshiharu Nakashima of Fukaya-shi (JP)
PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSURE APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18397308 titled 'PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSURE APPARATUS
Simplified Explanation: The patent application describes a pattern-exposure apparatus that projects patterns onto a substrate using a spatial light modulating element and an illumination unit with a condensing optical member and a correcting optical member.
- Spatial light modulating element with micro-mirrors driven based on drawing data
- Illumination unit that irradiates the element with light at a predetermined angle
- Projection unit that projects reflected light from selected micro-mirrors to the substrate
- Condensing optical member in the illumination unit to obliquely irradiate light
- Correcting optical member to deform the shape of the light source for distortion correction
Potential Applications: This technology can be used in semiconductor manufacturing, display production, and other industries requiring precise pattern exposure on substrates.
Problems Solved: The apparatus addresses issues related to distortion correction, precise pattern projection, and efficient exposure processes in manufacturing.
Benefits: The benefits include improved accuracy in pattern exposure, enhanced image quality, and increased efficiency in manufacturing processes.
Commercial Applications: Title: Advanced Pattern-Exposure Technology for Semiconductor Manufacturing This technology can be commercially applied in semiconductor fabrication facilities, display manufacturing plants, and other high-tech industries requiring precise pattern exposure on substrates.
Prior Art: Researchers can explore prior patents related to pattern exposure apparatus, spatial light modulating elements, and optical correction technologies in the field of semiconductor manufacturing.
Frequently Updated Research: Stay updated on advancements in spatial light modulating technology, optical correction methods, and pattern exposure techniques for semiconductor manufacturing.
Questions about Pattern-Exposure Technology: 1. How does the condensing optical member improve the pattern exposure process? 2. What are the key advantages of using a spatial light modulating element in pattern projection systems?
Original Abstract Submitted
A pattern-exposure-apparatus includes: spatial-light-modulating-element including a plurality of micro-mirrors selectively driven based on drawing data, illumination-unit that irradiates spatial-light-modulating-element with illumination-light at predetermined-incidence-angle, and projection-unit that projects reflected-light from selected micro-mirrors of spatial-light-modulating-element in ON-state to substrate, and pattern-exposure-apparatus projects and exposes pattern corresponding to drawing data to substrate, illumination-unit including condensing-optical-member that condenses light from surface-light-source having predetermined shape so as to obliquely irradiate light to spatial-light-modulating-element and that is disposed along optical-axis which is inclined at incidence-angle with respect to optical-axis of projection-unit so as to optically conjugate surface-light-source with pupil of projection-unit, and correcting-optical-member that deforms shape of outline of the surface-light-source so as to correct distortion of outline of image of the surface-light-source, which is formed on pupil of the projection-unit by reflected-light from micro-mirrors of the spatial-light-modulating-element in ON-state, into elliptical-shape according to incidence-angle.
