18391661. SUBSTRATE PROCESSING APPARATUS simplified abstract (SEMES CO., LTD.)
Contents
SUBSTRATE PROCESSING APPARATUS
Organization Name
Inventor(s)
Jongwha Kang of Cheonan-si (KR)
Sunwook Jung of Hwaseong-si (KR)
Byoungdoo Choi of Cheonan-si (KR)
SUBSTRATE PROCESSING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18391661 titled 'SUBSTRATE PROCESSING APPARATUS
The patent application describes a substrate processing apparatus with a processing vessel, a support unit for rotating the substrate, and an exhaust unit to remove gas from the internal space.
- The processing unit includes a processing vessel with an internal space.
- The support unit rotates the substrate in the internal space in a first rotation direction.
- The exhaust unit removes gas from the internal space through an exhaust pipe.
- One end of the exhaust pipe is closed, and an open outlet at the remaining end discharges the gas.
Potential Applications: - Semiconductor manufacturing - Thin film deposition processes - Solar panel production
Problems Solved: - Efficient removal of gas during substrate processing - Enhanced control over processing environment
Benefits: - Improved processing quality - Increased productivity - Reduced contamination risks
Commercial Applications: Title: Advanced Substrate Processing Apparatus for Semiconductor Manufacturing This technology can be used in semiconductor fabrication facilities to enhance production efficiency and product quality.
Questions about Substrate Processing Apparatus: 1. How does the exhaust unit improve the processing environment? The exhaust unit removes gas from the internal space, ensuring a clean and controlled environment for substrate processing.
2. What are the advantages of rotating the substrate in a specific direction? Rotating the substrate in a specific direction allows for uniform processing and deposition on the substrate surface.
Original Abstract Submitted
A substrate processing apparatus includes a processing unit including a processing vessel with an internal space and a support unit configured to support a substrate and rotate the substrate in a first rotation direction in the internal space, and an exhaust unit configured to exhaust a gas from the internal space, wherein the exhaust unit includes an exhaust pipe providing an exhaust path for the gas exhausted from the internal space, and one or more connectors connecting the processing vessel to the exhaust pipe, and one end of the exhaust pipe is closed, and an open outlet is formed at a remaining end of the exhaust pipe to discharge the gas.
