18356612. METHOD AND APPARATUS WITH SEMICONDUCTOR PATTERN CORRECTION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
- 1 METHOD AND APPARATUS WITH SEMICONDUCTOR PATTERN CORRECTION
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 METHOD AND APPARATUS WITH SEMICONDUCTOR PATTERN CORRECTION - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Key Features and Innovation
- 1.6 Potential Applications
- 1.7 Problems Solved
- 1.8 Benefits
- 1.9 Commercial Applications
- 1.10 Prior Art
- 1.11 Frequently Updated Research
- 1.12 Questions about Neural Network Image Correction and Simulation Technology
- 1.13 Original Abstract Submitted
METHOD AND APPARATUS WITH SEMICONDUCTOR PATTERN CORRECTION
Organization Name
Inventor(s)
Seong-Jin Park of Suwon-si (KR)
Seon Min Rhee of Suwon-si (KR)
METHOD AND APPARATUS WITH SEMICONDUCTOR PATTERN CORRECTION - A simplified explanation of the abstract
This abstract first appeared for US patent application 18356612 titled 'METHOD AND APPARATUS WITH SEMICONDUCTOR PATTERN CORRECTION
Simplified Explanation
The patent application describes a method using neural networks to correct and simulate images of desired patterns, reducing errors between the desired and simulated images.
Key Features and Innovation
- Utilizes a backward correction neural network to correct images based on desired patterns.
- Employs a forward simulation neural network to simulate the performance of a process.
- Updates corrected images to minimize errors between desired and simulated images.
Potential Applications
This technology can be applied in various fields such as image processing, quality control in manufacturing, and pattern recognition.
Problems Solved
- Reduces errors in image correction and simulation processes.
- Enhances the accuracy of desired pattern image reproduction.
Benefits
- Improved image correction and simulation accuracy.
- Enhanced quality control in manufacturing processes.
- Increased efficiency in pattern recognition tasks.
Commercial Applications
- "Neural Network Image Correction and Simulation Technology for Enhanced Manufacturing Quality Control"
- This technology can be utilized in industries such as semiconductor manufacturing, printing, and textile production for quality control and process optimization.
Prior Art
Further research can be conducted in the field of neural network-based image correction and simulation to explore existing technologies and advancements.
Frequently Updated Research
Stay updated on advancements in neural network technologies for image processing and quality control applications.
Questions about Neural Network Image Correction and Simulation Technology
How does this technology improve image correction processes?
This technology utilizes neural networks to correct images based on desired patterns, reducing errors and improving accuracy.
What are the potential applications of this technology beyond image processing?
This technology can be applied in various industries such as manufacturing, healthcare, and security for quality control, process optimization, and pattern recognition tasks.
Original Abstract Submitted
A processor-implemented method including generating a first corrected result image of a first desired pattern image using a backward correction neural network provided an input based on the first desired pattern image, the backward correction neural network performing a backward correction of a first process, generating a first simulated result image using a forward simulation neural network based on the first corrected result image, the forward simulation neural network performing a forward simulation of a performance of the first process, and updating the first corrected result image so that an error between the first desired pattern image and the first simulated result image is reduced.
