18141990. SEMICONDUCTOR DEVICES simplified abstract (Samsung Electronics Co., Ltd.)
Contents
SEMICONDUCTOR DEVICES
Organization Name
Inventor(s)
SEMICONDUCTOR DEVICES - A simplified explanation of the abstract
This abstract first appeared for US patent application 18141990 titled 'SEMICONDUCTOR DEVICES
Simplified Explanation: The semiconductor device described in the patent application includes various patterns and structures on a substrate to enhance its functionality.
- An active pattern is present on the substrate.
- An isolation pattern covers the opposite sidewalls of the active pattern.
- A liner, made of a different material from the isolation pattern, is on top of the isolation pattern.
- A gate structure contacts the upper surface of the active pattern and the upper surface of the liner.
- Multiple channels are spaced apart in a vertical direction, perpendicular to the substrate's upper surface, and extend through the gate structure.
Key Features and Innovation:
- Integration of active and isolation patterns for improved performance.
- Use of a liner with a different material to enhance structural integrity.
- Incorporation of multiple channels for efficient functionality.
Potential Applications: This technology can be applied in:
- Semiconductor manufacturing.
- Electronics industry for improved device performance.
Problems Solved:
- Enhanced structural integrity.
- Improved functionality and performance of semiconductor devices.
Benefits:
- Increased efficiency in semiconductor devices.
- Enhanced reliability and durability.
- Potential for advanced technological applications.
Commercial Applications: Title: Advanced Semiconductor Device Technology for Enhanced Performance This technology can be utilized in various commercial sectors such as:
- Consumer electronics.
- Telecommunications industry.
- Automotive sector for advanced driver assistance systems.
Prior Art: Readers can explore prior research in semiconductor device manufacturing and materials science to understand the evolution of similar technologies.
Frequently Updated Research: Stay updated on the latest advancements in semiconductor device technology and materials science for potential improvements and innovations.
Questions about Semiconductor Device Technology: 1. How does the integration of different patterns and structures impact the overall performance of semiconductor devices? 2. What potential challenges could arise in the manufacturing process of semiconductor devices with these advanced features?
Original Abstract Submitted
A semiconductor device may include an active pattern on a substrate; an isolation pattern on the substrate, the isolation pattern covering opposite sidewalls of the active pattern; a liner on the isolation pattern, a liner including a material different from the isolation pattern; a gate structure contacting an upper surface of the active pattern and an upper surface of the liner; and a plurality of channels spaced apart from each other in a vertical direction perpendicular to an upper surface of the substrate, each of the plurality of channels extending through the gate structure.
