18125738. SUBSTRATE TREATING APPARATUS simplified abstract (SEMES CO., LTD.)

SUBSTRATE TREATING APPARATUS

Organization Name

SEMES CO., LTD.

Inventor(s)

Young Seo An of Gyeonggi-do (KR)

Jae Hoon Park of Gyeonggi-do (KR)

Young Ju Jo of Gyeonggi-do (KR)

Kyung Jin Seo of Chungcheongnam-do (KR)

Seo Jung Park of Gyeonggi-do (KR)

Dae Myeong Lee of Busan (KR)

Jae Hyun Lim of Chungcheongnam-do (KR)

Nam Kyu Kim of Chungcheongnam-do (KR)

SUBSTRATE TREATING APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18125738 titled 'SUBSTRATE TREATING APPARATUS

The abstract describes a substrate treating apparatus that includes a spin chuck supporting a substrate, a rinse liquid supply unit, a first bowl with an inclined surface, and a guide part forming a spiral to guide the flow of rinse liquid along the spiral.

• Spin chuck supporting substrate
• Rinse liquid supply unit providing rinse liquid
• First bowl with inclined surface
• Guide part forming a spiral to guide rinse liquid flow
• Enhanced substrate treatment process

Potential Applications: - Semiconductor manufacturing - Thin film deposition processes - Solar panel production

Problems Solved: - Efficient rinse liquid distribution - Improved substrate cleaning process

Benefits: - Enhanced substrate treatment efficiency - Reduced substrate contamination - Increased production yield

Commercial Applications: - Semiconductor industry - Electronics manufacturing - Solar energy sector

Questions about the technology: 1. How does the guide part optimize the flow of rinse liquid? 2. What are the specific benefits of using this substrate treating apparatus?

Frequently Updated Research: - Ongoing studies on optimizing rinse liquid distribution in substrate treatment processes.

Original Abstract Submitted

A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; a first bowl including an inclined surface inclined downward in an outward direction of the spin chuck; and a guide part provided on the inclined surface of the first bowl so as to form a spiral surrounding the spin chuck and guiding a flow of the rinse liquid along the spiral.