17730928. SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

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SEMICONDUCTOR DEVICE

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Dahye Kim of Seoul (KR)

Sujin Jung of Hwaseong-si (KR)

Ingyu Jang of Seoul (KR)

Jinbum Kim of Seoul (KR)

SEMICONDUCTOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 17730928 titled 'SEMICONDUCTOR DEVICE

Simplified Explanation

The patent application describes a semiconductor device with a unique structure and configuration. Here are the key points:

  • The device has a fin-type active region that protrudes from a substrate and extends in one direction.
  • Multiple channel layers are placed on the fin-type active region, spaced apart from each other in a perpendicular direction to the substrate's upper surface.
  • A gate structure intersects the fin-type active region, surrounds each channel layer, and extends in the perpendicular direction.
  • Fence spacers are located on the side surfaces of the fin-type active region, adjacent to the gate structure, and also extend in the perpendicular direction.
  • A source/drain region is present between the fence spacers on the fin-type active region, connected to each channel layer, and has voids in the side surfaces next to the fence spacers.

Potential applications of this technology:

  • This semiconductor device can be used in various electronic devices such as smartphones, tablets, computers, and other consumer electronics.
  • It can also be applied in industrial applications, including automotive electronics, aerospace systems, and communication devices.

Problems solved by this technology:

  • The unique configuration of the device helps to improve its performance and efficiency.
  • The presence of the fin-type active region and the multiple channel layers allows for better control of the electrical properties of the device.
  • The gate structure and fence spacers help in reducing leakage currents and improving the overall functionality of the device.

Benefits of this technology:

  • The semiconductor device offers improved performance and efficiency compared to conventional devices.
  • It provides better control over the electrical properties, leading to enhanced functionality.
  • The reduced leakage currents contribute to lower power consumption and improved power efficiency.


Original Abstract Submitted

A semiconductor device includes a fin-type active region that protrudes from a substrate and extends in a first direction, a plurality of channel layers on the fin-type active region that are spaced apart from each other in a second direction that is perpendicular to an upper surface of the substrate, a gate structure that intersects the fin-type active region, extends in the second direction, and surrounds each of the plurality of channel layers in a third direction, fence spacers on side surfaces of the fin-type active region in the second direction on sides of the gate structure and extending in the second direction, and a source/drain region between the fence spacers on the fin-type active region at sides of the gate structure, connected to each of the plurality of channel layers, and having voids in side surfaces adjacent the fence spacers.