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Category:H01L21/67
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Pages in category "H01L21/67"
The following 200 pages are in this category, out of 655 total.
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- 18354191. LOAD PORT MODULE AND DRIVING METHOD THEREOF simplified abstract (Samsung Electronics Co., Ltd.)
- 18357293. METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18357725. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18361129. System and Method for Measuring Thermal Performance of Substrates used in Semiconductor Device Assembly simplified abstract (Western Digital Technologies, Inc.)
- 18367742. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (TOKYO ELECTRON LIMITED)
- 18368116. SEMICONDUCTOR POST-PROCESS IMPACT DETECTION DEVICE, SEMICONDUCTOR POST-PROCESS TRANSPORTATION SYSTEM INCLUDING SAME, AND IMPACT LOCATION TRACKING METHOD USING SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18368422. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- 18370139. DEVICE AND METHOD FOR SORTING SEMICONDUCTOR CHIP WITH POTENTIAL FAILURE RISK simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18371774. METHOD OF SPLITTING SEMICONDUCTOR CHIP USING MECHANICAL MACHINING AND SEMICONDUCTOR CHIP SPLIT BY THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18372811. LARGE DIAMETER POROUS PLUG FOR ARGON DELIVERY simplified abstract (Applied Materials, Inc.)
- 18373364. SEMICONDUCTOR MANUFACTURING APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
- 18375202. BRUSHES, SYSTEMS, AND METHODS FOR POST-CMP CLEANING OF A SURFACE simplified abstract (ILLINOIS TOOL WORKS INC.)
- 18380986. PROCESSING LIQUID SUPPLY SYSTEM AND OPERATION METHOD THEREOF simplified abstract (Tokyo Electron Limited)
- 18381032. METHOD AND COMPUTING SYSTEM FOR MANUFACTURING THREE-DIMENSIONAL SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18382239. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (SEMES CO., LTD.)
- 18389664. RECONFIGURABLE MAINFRAME WITH REPLACEABLE INTERFACE PLATE HAVING REPLACEABLE CHAMBER PORTS simplified abstract (Applied Materials, Inc.)
- 18389669. SEMICONDUCTOR WAFER DETECTION DEVICE AND DROPLET GUIDE MEMBER simplified abstract (EBARA CORPORATION)
- 18390323. SUBSTRATE ETCHING APPARATUS AND SUBSTRATE ETCHING METHOD simplified abstract (Samsung Display Co., LTD.)
- 18390547. SUBSTRATE PROCESSING SYSTEM, CONTROL DEVICE, AND SUBSTRATE TRANSFER PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 18391661. SUBSTRATE PROCESSING APPARATUS simplified abstract (SEMES CO., LTD.)
- 18393884. SUBSTRATE PROCESSING APPARATUS simplified abstract (SEMES CO., LTD.)
- 18394068. SUBSTRATE PROCESSING APPARATUS AND METHOD OF CONTROLLING THE SAME simplified abstract (SEMES CO., LTD.)
- 18394735. SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD simplified abstract (EBARA CORPORATION)
- 18395173. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (SEMES CO., LTD.)
- 18395487. AIRFLOW CONTROL SYSTEM AND AIRFLOW CONTROL METHOD simplified abstract (SEMES CO., LTD.)
- 18395570. SUBSTRATE TRANSFERRING APPARATUS, AND LIQUID PROCESSING APPARATUS AND SUBSTRATE PROCESSING EQUIPMENT INCLUDING SAME simplified abstract (SEMES CO., LTD.)
- 18397549. SEMICONDUCTOR PROCESSING APPARATUS WITH ENHANCED CHAMBER USABILITY AND THE METHOD THEREOF simplified abstract (ASM IP Holding B.V.)
- 18399894. VALVE CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME simplified abstract (SEMES CO., LTD.)
- 18402094. CONVEYANCE APPARATUS, CONVEYANCE METHOD, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18402814. SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18403613. MODULAR PRESSURIZED WORKSTATION simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18404333. SEMICONDUCTOR TRANSPORT SYSTEM AND METHOD OF TRANSPORTING SEMICONDUCTOR simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18405030. SEMICONDUCTOR FABRICATING SYSTEM HAVING HYBRID BRUSH ASSEMBLY simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18407631. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18409400. WIPER FOR TRANSFERRING MICRO SEMICONDUCTOR CHIP AND APPARATUS FOR COLLECTING MICRO SEMICONDUCTOR CHIP simplified abstract (Samsung Electronics Co., Ltd.)
- 18413497. SUBSTRATE PROCESSING APPARATUS AND METHOD OF ESTIMATING FLOW RATE OF PROCESSING LIQUID FOR SUBSTRATE PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18415798. SUBSTRATE BONDING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18417564. SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 18418827. CHEMICAL SUPPLY APPARATUS, SEMICONDUCTOR FABRICATION SYSTEM INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18419696. Semiconductor Devices and Methods of Manufacturing simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18419867. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 18420068. MULTI-FLIP SEMICONDUCTOR DIE SORTER TOOL simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18420184. APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18423577. TOOLS AND METHODS FOR SUBTRACTIVE METAL PATTERNING simplified abstract (Intel Corporation)
- 18429479. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 18432450. DEFECT REDUCTION APPARATUS AND DEFECT REDUCTION METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- 18433810. JIG, SEMICONDUCTOR MANUFACTURING APPARATUS, AND METHOD OF OPERATING SEMICONDUCTOR MANUFACTURING APPARATUS simplified abstract (Kioxia Corporation)
- 18433853. REFLECTOR AND/OR METHOD FOR ULTRAVIOLET CURING OF SEMICONDUCTOR simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18433862. GAS SUPPLY SYSTEM, GAS CONTROL SYSTEM, PLASMA PROCESSING APPARATUS, AND GAS CONTROL METHOD simplified abstract (Tokyo Electron Limited)
- 18433899. SYSTEM AND METHOD FOR DIAGNOSING PLASMA CHAMBER simplified abstract (ASM IP Holding B.V.)
- 18436248. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18436499. DEFORMABLE SUBSTRATE CHUCK simplified abstract (Applied Materials, Inc.)
- 18437058. METHODS, SYSTEMS, AND APPARATUS FOR CONDUCTING A RADICAL TREATMENT OPERATION PRIOR TO CONDUCTING AN ANNEALING OPERATION simplified abstract (Applied Materials, Inc.)
- 18437139. SYSTEMS AND METHODS FOR IN-SITU MARANGONI CLEANING simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18439492. SUBSTRATE SUPPORTER simplified abstract (Samsung Electronics Co., Ltd.)
- 18439813. SEMICONDUCTOR PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING SEMICONDUCTOR PROCESSING APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
- 18442234. METHODS AND APPARATUS FOR PRECLEANING AND TREATING WAFER SURFACES simplified abstract (Applied Materials, Inc.)
- 18442522. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PLACING METHOD simplified abstract (Tokyo Electron Limited)
- 18446900. SEMICONDUCTOR CHIP MOLDING DIE DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18447702. SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Kioxia Corporation)
- 18453190. METHOD OF FABRICATING DISPLAY PANEL simplified abstract (Samsung Display Co., LTD.)
- 18456652. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Kioxia Corporation)
- 18457785. MOUNTING DEVICE AND MOUNTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18463529. SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18465533. SEMICONDUCTOR MANUFACTURING EQUIPMENT, AND METHOD FOR TRANSPORTING REPLACEABLE COMPONENTS IN THE SEMICONDUCTOR MANUFACTURING EQUIPMENT simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18467683. SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD simplified abstract (SCREEN Holdings Co., Ltd.)
- 18468780. SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18468928. ETCHING CONTROL SYSTEM AND ETCHING CONTROL METHOD simplified abstract (TOKYO ELECTRON LIMITED)
- 18468966. ETCHING CONTROL SYSTEM AND ETCHING CONTROL METHOD simplified abstract (TOKYO ELECTRON LIMITED)
- 18469208. METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18469234. APPARATUS FOR FABRICATING DISPLAY PANEL AND FABRICATING METHOD THEREOF simplified abstract (Samsung Display Co., Ltd.)
- 18469619. SUBSTRATE TREATMENT APPARATUS AND METHOD FOR TREATING SUBSTRATE simplified abstract (Kioxia Corporation)
- 18469673. ETCHING CONTROL DEVICE, ETCHING CONTROL METHOD, AND ETCHING CONTROL SYSTEM simplified abstract (TOKYO ELECTRON LIMITED)
- 18469687. SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18470160. SUBSTRATE TREATING APPARATUS simplified abstract (SCREEN Holdings Co., Ltd.)
- 18473459. SUBSTRATE TREATMENT METHOD, SUBSTRATE TREATMENT APPARATUS, AND COMPUTER STORAGE MEDIUM simplified abstract (Tokyo Electron Limited)
- 18476341. MANUFACTURING DEVICE OF DISPLAY DEVICE simplified abstract (Japan Display Inc.)
- 18480249. SEMICONDUCTOR DEVICE MANUFACTURING METHOD, X-RAY DIFFRACTION DEVICE AND SEMICONDUCTOR PATTERN TRANSFER SYSTEM simplified abstract (Mitsubishi Electric Corporation)
- 18482401. SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18484562. APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18489188. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 18489229. SUBSTRATE PROCESSING APPARATUS AND FLUID HEATING DEVICE simplified abstract (Tokyo Electron Limited)
- 18490241. APPARATUS FOR CLEANING PROCESS AND METHOD FOR CLEANING PROCESS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18495180. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (SEMES CO., LTD.)
- 18495224. WAFER PROCESSING APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
- 18496015. SUBSTRATE PROCESSING SYSTEM AND ITS CONTROL METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18498194. Methods for measuring thickness and methods for manufacturing a device using the same simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18505474. SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT INCLUDING THE SAME simplified abstract (SEMES CO., LTD.)
- 18507008. APPARATUS FOR PROCESSING SUBSTRATE simplified abstract (SEMES CO., LTD.)
- 18507070. SUBSTRATE PROCESSING APPARATUS, OPERATING METHOD THEREOF, AND PHOTO SPINNER EQUIPMENT simplified abstract (SEMES CO., LTD.)
- 18507459. WAFER PROCESSING APPARATUS AND WAFER DICING METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- 18509104. APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18510646. PACKAGE STRUCTURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18511070. DISPLACEMENT CONTROL DEVICE FOR SEISMIC EVENTS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18513560. SUBSTRATE TREATING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT INCLUDING THE SAME simplified abstract (SEMES CO., LTD.)
- 18514859. SPACE FILLING DEVICE FOR WET BENCH simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18515842. Semiconductor Device, Method and Machine of Manufacture simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18515867. SUBSTRATE HEATER AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME simplified abstract (SEMES CO., LTD.)
- 18516703. SEMICONDUCTOR PROCESSING APPARATUS AND METHOD UTILIZING ELECTROSTATIC DISCHARGE (ESD) PREVENTION LAYER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18516821. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (SEMES CO., LTD.)
- 18516895. CARRIAGE SYSTEM CONTROL METHOD AND CARRIAGE SYSTEM CONTROL APPARATUS simplified abstract (SEMES CO., LTD.)
- 18517194. SEMICONDUCTOR WAFER CLEANING APPARATUS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18517457. SEMICONDUCTOR SUBSTRATE BONDING TOOL AND METHODS OF OPERATION simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18518393. SYSTEMS AND METHODS FOR CONTROLLING PRESSURE IN SUBSTRATE PROCESSING SYSTEMS simplified abstract (ASM IP Holding B.V.)
- 18519519. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS simplified abstract (TOKYO ELECTRON LIMITED)
- 18519913. REFLECTOR PLATE FOR SUBSTRATE PROCESSING simplified abstract (Applied Materials, Inc.)
- 18520047. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- 18522132. EQUIPMENT FRONT-END MODULES FOR SEMICONDUCTOR PROCESSING SYSTEMS AND METHODS OF MAKING SEMICONDUCTOR PROCESSING SYSTEMS simplified abstract (ASM IP Holding B.V.)
- 18522152. LOAD LOCK ARRANGEMENTS, SEMICONDUCTOR PROCESSING SYSTEMS HAVING LOAD LOCK ARRANGEMENTS, AND METHODS OF MAKING LOAD LOCKS FOR SEMICONDUCTOR PROCESSING SYSTEMS simplified abstract (ASM IP Holding B.V.)
- 18522675. HUMIDITY CONTROL DEVICE IN PROCESS SPACE, HUMIDITY CONTROL SYSTEM INCLUDING THE SAME, AND HUMIDITY CONTROL METHOD IN PROCESS SPACE simplified abstract (SEMES CO., LTD.)
- 18523021. HIGH-THROUGHPUT SILICON CARBIDE REACTOR simplified abstract (ASM IP Holding B.V.)
- 18523172. METHOD, SYSTEM AND APPARATUS FOR SUBSTRATE HANDLING AND COOLING simplified abstract (ASM IP Holding B.V.)
- 18523394. SINGLE WAFER PROCESSING ENVIRONMENTS WITH SPATIAL SEPARATION simplified abstract (Applied Materials, Inc.)
- 18523474. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (SCREEN Holdings Co., Ltd.)
- 18524082. TRANSFER SYSTEM, PROCESSING SYSTEM, AND TRANSFER METHOD simplified abstract (Tokyo Electron Limited)
- 18524164. PHOTORESIST COATING APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
- 18524726. SUBSTRATE PROCESSING APPARATUS AND METHOD simplified abstract (SEMES CO., LTD.)
- 18525207. VAPORIZER, PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Kokusai Electric Corporation)
- 18525309. METHOD FOR CALCULATING THROUGHPUT IN SEMICONDUCTOR MANUFACTURING APPARATUS, SEMICONDUCTOR MANUFACTURING APPARATUS, AND COMPUTER PROGRAM PRODUCT simplified abstract (EBARA CORPORATION)
- 18526472. SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18527552. BONDING APPARATUS, BONDING METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18527663. ADDITIVE PROCESS FOR CIRCULAR PRINTING simplified abstract (TEXAS INSTRUMENTS INCORPORATED)
- 18529057. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 18531929. SILICON CARBIDE WAFER MANUFACTURING APPARATUS simplified abstract (DENSO CORPORATION)
- 18531929. SILICON CARBIDE WAFER MANUFACTURING APPARATUS simplified abstract (TOYOTA JIDOSHA KABUSHIKI KAISHA)
- 18533256. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 18534223. LED-CHIP SORTING DEVICE AND LED CHIP MANUFACTURING METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- 18537574. METHOD FOR CMP TEMPERATURE CONTROL simplified abstract (Applied Materials, Inc.)
- 18537661. SUBSTRATE PROCESSING APPARATUS simplified abstract (SEMES CO., LTD.)
- 18538419. INTERNAL PRESSURE CONTROL APPARATUS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18539634. SUBSTRATE TREATING APPARATUS simplified abstract (SEMES CO., LTD.)
- 18541635. LIQUID CHEMICAL RECYCLE SYSTEM, LIQUID CHEMICAL SUPPLY SYSTEM, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE LIQUID CHEMICAL RECYCLE SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)
- 18542665. SUBSTRATE TREATMENT SYSTEM AND SUBSTRATE TREATMENT METHOD simplified abstract (SEMES CO., LTD.)
- 18543499. SUBSTRATE PROCESSING DEVICE simplified abstract (SEMES CO., LTD.)
- 18544315. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD simplified abstract (Samsung Display Co., LTD.)
- 18545919. SUBSTRATE PROCESSING APPARATUS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18547470. SUBSTRATE RESTRAINING SYSTEM simplified abstract (ASML NETHERLANDS B.V.)
- 18547888. FILM FORMING METHOD, PROCESSING APPARATUS, AND PROCESSING SYSTEM simplified abstract (Tokyo Electron Limited)
- 18551287. PROCESSING APPARATUS AND SUBSTRATE TRANSFER METHOD simplified abstract (Tokyo Electron Limited)
- 18552108. SUBSTRATE LIQUID-TREATMENT DEVICE simplified abstract (Tokyo Electron Limited)
- 18557675. PROCESSING SYSTEM AND METHODS FOR FORMING VOID-FREE AND SEAM-FREE TUNGSTEN FEATURES simplified abstract (Applied Materials, Inc.)
- 18559313. MULTI-SECTIONAL PLASMA CONFINEMENT RING STRUCTURE simplified abstract (Lam Research Corporation)
- 18562211. Single-Pick-Multiple-Print Micro LED Mass Transfer with Elastomer Stamp simplified abstract (Apple Inc.)
- 18563666. APPARATUSES FOR THERMAL MANAGEMENT OF A PEDESTAL AND CHAMBER simplified abstract (Lam Research Corporation)
- 18566183. SUBSTRATE PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18571803. ELECTRICAL ARRANGEMENT WITH A POSITIONING AID, AND PRODUCTION METHOD simplified abstract (Robert Bosch GmbH)
- 18572075. IMAGE ANALYSIS OF PLASMA CONDITIONS simplified abstract (Lam Research Corporation)
- 18581154. SYSTEM AND METHOD FOR BACKSIDE DEPOSITION OF A SUBSTRATE simplified abstract (Tokyo Electron Limited)
- 18584828. APPARATUS FOR PROCESSING SUBSTRATES OR WAFERS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18585352. APPARATUS FOR MANUFACTURING DISPLAY DEVICE simplified abstract (SAMSUNG DISPLAY CO., LTD.)
- 18585466. SUBSTRATE PROCESSING APPARATUS, MODEL DATA GENERATION APPARATUS, SUBSTRATE PROCESSING METHOD, AND MODEL DATA GENERATION METHOD simplified abstract (Tokyo Electron Limited)
- 18586209. MODULAR MAINFRAME LAYOUT FOR SUPPORTING MULTIPLE SEMICONDUCTOR PROCESS MODULES OR CHAMBERS simplified abstract (Applied Materials, Inc.)
- 18586310. AUTOMATED SUBSTRATE PLACEMENT TO CHAMBER CENTER simplified abstract (Applied Materials, Inc.)
- 18586372. SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Kioxia Corporation)
- 18588356. PROCESSING SYSTEM AND TRANSFER METHOD simplified abstract (Tokyo Electron Limited)
- 18589750. SUBSTRATE PROCESSING DEVICE simplified abstract (Kioxia Corporation)
- 18589845. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 18590235. SEMICONDUCTOR MANUFACTURING APPARATUS simplified abstract (Kioxia Corporation)
- 18592988. SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Kioxia Corporation)
- 18595341. SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Kioxia Corporation)
- 18595913. METHODS FOR COATING A SUBSTRATE WITH MAGNESIUM FLUORIDE VIA ATOMIC LAYER DEPOSITION simplified abstract (CORNING INCORPORATED)
- 18598273. BONDING APPARATUS, BONDING SYSTEM, AND BONDING METHOD simplified abstract (Tokyo Electron Limited)
- 18599767. Processing Chamber With Multiple Plasma Units simplified abstract (Applied Materials, Inc.)
- 18600219. ELECTROSTATIC CHUCK WITH MULTIPLE RADIO FREQUENCY MESHES TO CONTROL PLASMA UNIFORMITY simplified abstract (Applied Materials, Inc.)
- 18600829. TRANSFER APPARATUS simplified abstract (Tokyo Electron Limited)
- 18601017. VALVE STRUCTURE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18601670. ZONE-BASED CMP TARGET CONTROL simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18602099. CHAMBER ARCHITECTURE FOR EPITAXIAL DEPOSITION AND ADVANCED EPITAXIAL FILM APPLICATIONS simplified abstract (Applied Materials, Inc.)
- 18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18604257. CAPACITIVE SENSOR FOR MONITORING GAS CONCENTRATION simplified abstract (Applied Materials, Inc.)
- 18604923. ELECTRONIC APPARATUS AND MANUFACTURING METHOD THEREOF simplified abstract (SAMSUNG DISPLAY CO., LTD.)
- 18605526. NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR simplified abstract (Tokyo Electron Limited)
- 18605574. TREATMENT SOLUTION AND TREATMENT METHOD simplified abstract (KABUSHIKI KAISHA TOSHIBA)
- 18605574. TREATMENT SOLUTION AND TREATMENT METHOD simplified abstract (TOHOKU UNIVERSITY)
- 18605837. POWER SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTURING SYSTEM GROUP simplified abstract (Tokyo Electron Limited)
- 18605892. SUBSTRATE TRANSFER SYSTEM simplified abstract (Tokyo Electron Limited)
- 18607400. TEMPERATURE CONTROL DEVICE, SUBSTRATE PROCESSING APPARATUS, AND LIQUID AMOUNT CONTROL METHOD simplified abstract (Tokyo Electron Limited)
- 18608043. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18608198. CEILING HEATER, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS simplified abstract (Kokusai Electric Corporation)
- 18609164. APPARATUS FOR PROCESSING SUBSTRATE AND METHOD OF TRANSFERRING SUBSTRATE simplified abstract (Tokyo Electron Limited)
- 18610612. SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR PACKAGE ALIGNMENT METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- 18612221. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM simplified abstract (Kokusai Electric Corporation)
- 18615249. WAFER LIFT PIN SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18616255. CHEMICAL-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING HYDROXYARYL-TERMINATED POLYMER simplified abstract (NISSAN CHEMICAL CORPORATION)
- 18617960. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 18624608. LIGHT-EMITTING DEVICE simplified abstract (Innolux Corporation)
- 18625330. EFEM ROBOT AUTO TEACHING METHODOLOGY simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18626565. SUBSTRATE TRANSFER MECHANISM AND SUBSTRATE TRANSFERRING METHOD simplified abstract (Tokyo Electron Limited)
- 18627313. APPARATUS AND METHODS FOR EXHAUST CLEANING simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18640118. METHOD FOR MAPPING WAFERS IN A WAFER CARRIER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18640481. WAFER PROCESSING APPARATUS AND WAFER PROCESSING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18645658. Liquid Crystal Display Device simplified abstract (SEMICONDUCTOR ENERGY LABORATORY CO., LTD.)
- 18653097. FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN simplified abstract (Applied Materials, Inc.)
- 18653955. METHODS OF SELECTIVE OXIDATION ON RAPID THERMAL PROCESSING (RTP) CHAMBER WITH ACTIVE STEAM GENERATION simplified abstract (Applied Materials, Inc.)
- 18656987. SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18661609. PROGRESSIVE THERMAL DRYING CHAMBER FOR QUANTUM CIRCUITS simplified abstract (Microsoft Technology Licensing, LLC)
- 18663364. Methods of Forming Material Within Openings Extending into a Semiconductor Construction, and Semiconductor Constructions Having Fluorocarbon Material simplified abstract (Micron Technology, Inc.)
- 18663776. POWER ALARM AND FIRE LOADING RISK REDUCTION FOR A DEPOSITION TOOL simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18665683. HEATER ASSEMBLY WITH PROCESS GAP CONTROL FOR BATCH PROCESSING CHAMBERS simplified abstract (Applied Materials, Inc.)
- 18666299. METHOD AND DEVICE FOR PROCESSING PRODUCT MANUFACTURING MESSAGES, ELECTRONIC DEVICE, AND COMPUTER-READABLE STORAGE MEDIUM simplified abstract (BOE TECHNOLOGY GROUP CO., LTD.)