18612659. LIGHT SOURCES AND METHODS OF CONTROLLING; DEVICES AND METHODS FOR USE IN MEASUREMENT APPLICATIONS simplified abstract (ASML NETHERLANDS B.V.)

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LIGHT SOURCES AND METHODS OF CONTROLLING; DEVICES AND METHODS FOR USE IN MEASUREMENT APPLICATIONS

Organization Name

ASML NETHERLANDS B.V.

Inventor(s)

Marinus Petrus Reijnders of Eindhoven (NL)

Hendrik Sabert of London (GB)

Patrick Sebastian Uebel of Marloffstein (DE)

LIGHT SOURCES AND METHODS OF CONTROLLING; DEVICES AND METHODS FOR USE IN MEASUREMENT APPLICATIONS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18612659 titled 'LIGHT SOURCES AND METHODS OF CONTROLLING; DEVICES AND METHODS FOR USE IN MEASUREMENT APPLICATIONS

Simplified Explanation: The patent application discusses light sources, methods of controlling them, and devices for use in measurement applications, particularly in metrology.

  • Light sources and methods for controlling them are provided.
  • Devices for use in measurement applications, especially in metrology, are discussed.
  • Mechanisms for detecting and correcting variations in the light source, particularly stochastic variations, are outlined.
  • Feedback or feedforward approaches can be used for correction.
  • An exemplary method for controlling the spectral output of a light source emitting a time-varying spectrum is described.

Key Features and Innovation:

  • Control mechanisms for light sources
  • Detection and correction of variations in light sources
  • Feedback and feedforward approaches for correction
  • Method for controlling spectral output of light sources

Potential Applications:

  • Metrology
  • Lithographic apparatus
  • Measurement applications

Problems Solved:

  • Variations in light sources
  • Stochastic variations
  • Spectral output control

Benefits:

  • Improved accuracy in measurements
  • Enhanced control of light sources
  • Increased efficiency in metrology applications

Commercial Applications: Title: Advanced Light Source Control Technology for Metrology Applications This technology can be utilized in industries such as semiconductor manufacturing, optical metrology, and scientific research for precise measurements and control of light sources.

Prior Art: Readers can explore prior art related to light source control technology in the fields of metrology, lithography, and optical instrumentation.

Frequently Updated Research: Stay updated on the latest advancements in light source control technology for metrology applications to ensure optimal performance and accuracy in measurements.

Questions about Light Source Control Technology: 1. What are the potential challenges in implementing feedback or feedforward approaches for correcting variations in light sources? 2. How does the method for controlling the spectral output of a light source differ from traditional methods?


Original Abstract Submitted

Provided are light sources and methods of controlling them, and devices and methods for use in measurement applications, particularly in metrology, for example in a lithographic apparatus. The methods and devices provide mechanisms for detection and/or correction of variations in the light source, in particular stochastic variations. Feedback or feedforward approaches can be used for the correction of the source and/or the metrology outputs. An exemplary method of controlling the spectral output of a light source which emits a time-varying spectrum of light includes the steps of: determining at least one characteristic of the spectrum of light emitted from the light source; and using said determined characteristic to control the spectral output.