18444142. APPARATUS AND METHOD FOR GENERATING A PARAMETERIZED WAVEGUIDE OPTICAL ELEMENTS simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

APPARATUS AND METHOD FOR GENERATING A PARAMETERIZED WAVEGUIDE OPTICAL ELEMENTS

Organization Name

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor(s)

Feng-Wei Kuo of Zhudong Township (TW)

Wen-Shiang Liao of Miaoli County (TW)

APPARATUS AND METHOD FOR GENERATING A PARAMETERIZED WAVEGUIDE OPTICAL ELEMENTS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18444142 titled 'APPARATUS AND METHOD FOR GENERATING A PARAMETERIZED WAVEGUIDE OPTICAL ELEMENTS

Simplified Explanation: This patent application describes a method and system for creating a physical layout for a grating coupler integrated into a photonically-enabled circuit. The layout is generated based on various input parameters and a predefined model, allowing for efficient manufacturing under a semiconductor fabrication process.

• Key Features and Innovation:

   - Method for generating physical layout for a grating coupler in a photonically-enabled circuit.
   - Utilizes parametrized inputs such as wavelength, refractive indices, taper length, width, grating length, and incident angle.
   - Layout generation based on a predefined model for manufacturing efficiency.

• Potential Applications:

   - Integrated photonics circuits.
   - Optical communication systems.
   - Semiconductor fabrication processes.

• Problems Solved:

   - Efficient design and manufacturing of grating couplers.
   - Optimization of layout for photonically-enabled circuits.
   - Streamlining semiconductor fabrication processes.

• Benefits:

   - Enhanced performance of photonically-enabled circuits.
   - Cost-effective manufacturing of grating couplers.
   - Improved integration of optical components.

• Commercial Applications:

   - "Method and system for generating physical layout for a grating coupler in a photonically-enabled circuit" can be utilized in the development of advanced optical communication systems, integrated photonics circuits, and semiconductor fabrication processes.

• Prior Art:

   - Readers can explore prior research on grating coupler design, integrated photonics, and semiconductor fabrication processes to understand the existing knowledge in this field.

• Frequently Updated Research:

   - Stay updated on advancements in integrated photonics, semiconductor fabrication, and optical communication systems to enhance the understanding and application of this technology.

Questions about Grating Coupler Layout Generation: 1. What are the key parameters considered in generating the physical layout for a grating coupler?

  - The key parameters include wavelength, refractive indices, taper length, width, grating length, and incident angle.
  

2. How does the predefined model contribute to the efficient manufacturing of the grating coupler layout?

  - The predefined model guides the layout generation process, ensuring optimal design for manufacturing under a semiconductor fabrication process.

Original Abstract Submitted

A method and system for generating a physical layout for a grating coupler integrated in a photonically-enabled circuit are disclosed herein. In some embodiments, the method receives a parametrized wavelength, a parametrized first refractive index, a parametrized second refractive index, a parametrized taper length, a parametrized width, a parametrized grating length, and a parametrized incident angle of the optical beam incident onto the grating coupler and generates a physical layout for the grating coupler based on the received parametrized inputs, the generating of the physical layout is according to a predefined model, and outputs the physical layout of the grating coupler for manufacturing under a semiconductor fabrication process.