US Patent Application 18365529. SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHY CHEMICAL SOLUTIONS simplified abstract

SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHY CHEMICAL SOLUTIONS

Organization Name

Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor(s)

Wen-Zhan Zhou of Zhubei City (TW)

Heng-Jen Lee of Baoshan Township (TW)

Hsu-Yuan Liu of Zhudong Township (TW)

Yu-Chen Huang of Toufen Township (TW)

Cheng-Han Wu of Taichung City (TW)

Shih-Che Wang of Hsin-Chu City (TW)

Ho-Yung David Hwang of Chu Pei City (TW)

SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHY CHEMICAL SOLUTIONS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18365529 titled 'SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHY CHEMICAL SOLUTIONS

Simplified Explanation

The patent application describes a method for supplying a chemical solution to a photolithography system.

• The chemical solution is pumped from a variable-volume buffer tank.
• The pumped chemical solution is dispensed in a spin-coater.
• To refill the variable-volume buffer tank, a storage container filled with the chemical solution is emptied into it.

Original Abstract Submitted

A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.