18541526. PLASMA PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
Contents
PLASMA PROCESSING APPARATUS
Organization Name
Inventor(s)
Takashi Aramaki of Kurokawa-gun (JP)
Hiroshi Tsujimoto of Kurokawagun (JP)
PLASMA PROCESSING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18541526 titled 'PLASMA PROCESSING APPARATUS
The present disclosure pertains to a plasma processing apparatus with multiple bias electrodes and voltage pulse generators.
- Plasma processing apparatus with a plasma processing chamber.
- Includes a first bias electrode with a first outer diameter.
- Also includes a second bias electrode with a second outer diameter.
- Additionally, a third bias electrode with a third outer diameter is present.
- Equipped with a first, second, and third DC power supply.
- Features a voltage adder for combining voltage signals.
- First voltage pulse generator generates a pulse signal for the first bias electrode.
- Second voltage pulse generator generates a pulse signal for the second bias electrode.
- Third voltage pulse generator generates a pulse signal for the third bias electrode.
Potential Applications: - Semiconductor manufacturing processes. - Thin film deposition. - Surface treatment of materials.
Problems Solved: - Enhanced control over plasma processing parameters. - Improved uniformity in material processing.
Benefits: - Increased efficiency in plasma processing. - Greater flexibility in adjusting bias voltages. - Enhanced quality and consistency of processed materials.
Commercial Applications: Title: Advanced Plasma Processing Apparatus for Semiconductor Manufacturing This technology can be utilized in semiconductor fabrication facilities to improve the quality and efficiency of manufacturing processes.
Questions about Plasma Processing Apparatus: 1. How does the presence of multiple bias electrodes improve plasma processing efficiency?
- The multiple bias electrodes allow for more precise control over the plasma parameters, resulting in enhanced processing efficiency.
2. What advantages do voltage pulse generators offer in plasma processing?
- Voltage pulse generators enable the generation of specific voltage signals to tailor the processing conditions, leading to improved outcomes in material processing.
Original Abstract Submitted
The purpose of the present disclosure is to provide a plasma processing apparatus including: a plasma processing chamber; a first bias electrode disposed in an electrostatic chuck to have a first outer diameter; a second bias electrode disposed in the electrostatic chuck to have a second outer diameter; a third bias electrode disposed in the electrostatic chuck to have a third outer diameter; a first DC power supply; a second DC power supply; a third DC power supply; a voltage adder; a first voltage pulse generator electrically connected to the first bias electrode and configured to generate a first voltage pulse signal; a second voltage pulse generator electrically connected to the second bias electrode and configured to generate a second voltage pulse signal; and a third voltage pulse generator electrically connected to the third bias electrode and configured to generate a third voltage pulse signal.
