18557744. CONTAINER simplified abstract (Tokyo Electron Limited)
Contents
- 1 CONTAINER
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 CONTAINER - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Key Features and Innovation
- 1.6 Potential Applications
- 1.7 Problems Solved
- 1.8 Benefits
- 1.9 Commercial Applications
- 1.10 Questions about the Technology
- 1.11 Original Abstract Submitted
CONTAINER
Organization Name
Inventor(s)
Katsuhiro Tsuchiya of Tokyo (JP)
Takeshi Hirao of Koshi City, Kumamoto (JP)
Hiroichi Inada of Koshi City, Kumamoto (JP)
Yoshimichi Kutsuna of Toyohashi-shi, Aichi (JP)
Takashi Yamamoto of Toyohashi-shi, Aichi (JP)
CONTAINER - A simplified explanation of the abstract
This abstract first appeared for US patent application 18557744 titled 'CONTAINER
Simplified Explanation
This patent application describes a technique for reducing the burden in processing a substrate using a processing liquid.
- A container with a storage space for the processing liquid is provided.
- The container has a discharge port for the processing liquid.
- A fragile member in the container can be broken to create an access path for a penetrating member.
- The penetrating member pressurizes the storage space to discharge the processing liquid.
Key Features and Innovation
- Container with storage space for processing liquid.
- Discharge port for processing liquid.
- Fragile member for creating access path.
- Penetrating member for pressurizing storage space.
Potential Applications
This technology can be used in industries that require precise processing of substrates using liquid solutions, such as semiconductor manufacturing, pharmaceutical production, and metal finishing.
Problems Solved
This technology reduces the burden in processing substrates by providing a more efficient and controlled way to discharge processing liquid.
Benefits
- Improved processing efficiency.
- Reduced labor and time costs.
- Enhanced precision in substrate processing.
Commercial Applications
- Semiconductor manufacturing.
- Pharmaceutical production.
- Metal finishing industries.
Questions about the Technology
How does this technology improve substrate processing efficiency?
This technology improves efficiency by providing a controlled and precise way to discharge processing liquid onto substrates.
What industries can benefit from this technology?
Industries such as semiconductor manufacturing, pharmaceutical production, and metal finishing can benefit from this technology.
Original Abstract Submitted
A technique capable of reducing, when processing a substrate by using a processing liquid, a burden in the processing and a burden in works involved in the processing is provided. A container includes a storage space forming unit in which a storage space storing therein a processing liquid configured to process a substrate is formed; a discharge port of the processing liquid, provided in the storage space forming unit; and a fragile member provided in the storage space forming unit and configured to be broken by being pressurized with a penetrating member in order to form an access path, the penetrating member being configured to pressurize the storage space such that the processing liquid is discharged from the discharge port, and the penetrating member being advanced into the storage space forming unit through the access path.
