18603316. ANALYSIS METHOD simplified abstract (CANON KABUSHIKI KAISHA)

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ANALYSIS METHOD

Organization Name

CANON KABUSHIKI KAISHA

Inventor(s)

YOSHIHIRO Shiode of Tochigi (JP)

ANALYSIS METHOD - A simplified explanation of the abstract

This abstract first appeared for US patent application 18603316 titled 'ANALYSIS METHOD

Simplified Explanation: The patent application describes a method for analyzing a process in semiconductor device manufacturing using data sets to generate learning data and a model for the process.

  • **Key Features and Innovation:**
   - Preparation of data sets with input and output for a simulator.
   - Generation of learning data based on process information and evaluation information.
   - Creation of a model through learning from the generated data.
  • **Potential Applications:**
   - Quality control in semiconductor manufacturing processes.
   - Optimization of manufacturing processes for efficiency and cost-effectiveness.
  • **Problems Solved:**
   - Lack of efficient methods for analyzing and optimizing semiconductor manufacturing processes.
   - Difficulty in predicting and controlling outcomes in the manufacturing process.
  • **Benefits:**
   - Improved quality control and process optimization.
   - Enhanced efficiency and cost savings in semiconductor manufacturing.
  • **Commercial Applications:**
   - "Process Analysis and Optimization Method for Semiconductor Manufacturing" can be utilized by semiconductor companies to improve their manufacturing processes, leading to higher quality products and reduced production costs.
  • **Prior Art:**
   - Researchers and engineers in the semiconductor industry may find relevant prior art in studies on process optimization and control in semiconductor manufacturing.
  • **Frequently Updated Research:**
   - Stay updated on advancements in machine learning algorithms for process optimization in semiconductor manufacturing.

Questions about Process Analysis and Optimization Method for Semiconductor Manufacturing:

1. *How does this method contribute to improving the efficiency of semiconductor manufacturing processes?*

  This method utilizes learning data to generate a model that can predict outcomes and optimize the manufacturing process, leading to increased efficiency.

2. *What are the potential implications of implementing this method in the semiconductor industry?*

  Implementing this method can result in higher quality semiconductor devices, reduced production costs, and improved competitiveness in the market.


Original Abstract Submitted

An analysis method of analyzing a process for manufacturing a semiconductor device, includes a preparing step of preparing a plurality of data sets each including an input to a simulator that simulates the process and an output from the simulator, a generating step of generating, based on the plurality of data sets, a plurality of learning data having, as a value of an explanatory variable, a value of information, of process information associated with at least one of control and a state of the process, to which attention is to be paid and a value of evaluation information for evaluating the process as a valued of an objective variable, and a learning step of generating a model expressing the process by performing learning based on the plurality of learning data generated in the generating step.