Samsung electronics co., ltd. (20240202910). METHOD AND APPARATUS WITH SEMICONDUCTOR IMAGE PROCESSING simplified abstract
Contents
METHOD AND APPARATUS WITH SEMICONDUCTOR IMAGE PROCESSING
Organization Name
Inventor(s)
Seong-Jin Park of Suwon-si (KR)
Seon Min Rhee of Suwon-si (KR)
METHOD AND APPARATUS WITH SEMICONDUCTOR IMAGE PROCESSING - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240202910 titled 'METHOD AND APPARATUS WITH SEMICONDUCTOR IMAGE PROCESSING
The abstract of this patent application describes a processor-implemented method for transforming semiconductor patterns in the manufacturing process.
- Identifying input components of a semiconductor pattern from an original input image
- Generating an augmented input image by transforming the input components
- Executing a neural model to estimate pattern transformation based on the augmented input image
Potential Applications: - Semiconductor manufacturing processes - Image processing in the semiconductor industry
Problems Solved: - Enhancing accuracy and efficiency in pattern transformation - Improving the quality of semiconductor manufacturing processes
Benefits: - Increased precision in pattern transformation - Streamlined semiconductor manufacturing processes
Commercial Applications: Title: "Advanced Semiconductor Pattern Transformation Technology" This technology could be utilized by semiconductor companies to optimize their manufacturing processes, leading to higher quality products and increased efficiency in production.
Questions about Semiconductor Pattern Transformation Technology: 1. How does this technology improve the accuracy of pattern transformation in semiconductor manufacturing? - This technology utilizes neural models to estimate pattern transformation, enhancing precision and efficiency in the manufacturing process.
2. What are the potential applications of this technology beyond semiconductor manufacturing? - This technology could potentially be applied to other industries that require image processing and pattern transformation for manufacturing processes.
Original Abstract Submitted
a processor-implemented method includes: identifying input components of a semiconductor pattern of an original input image from the original input image corresponding to an application target of a process for manufacturing a semiconductor, generating an augmented input image by transforming a transformation target comprising one or more of the input components from the original input image; and executing a neural model for estimating pattern transformation according to the process based on the augmented input image.
