18530369. MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE simplified abstract (CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.)
Contents
- 1 MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Key Features and Innovation
- 1.6 Potential Applications
- 1.7 Problems Solved
- 1.8 Benefits
- 1.9 Commercial Applications
- 1.10 Prior Art
- 1.11 Frequently Updated Research
- 1.12 Questions about Mask Design
- 1.13 Original Abstract Submitted
MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE
Organization Name
CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
Inventor(s)
Zhongying Yang of Beijing (CN)
MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18530369 titled 'MASK AND MANUFACTURING METHOD THEREFOR, AND MANUFACTURING METHOD FOR DISPLAY SUBSTRATE
Simplified Explanation
The patent application describes a mask with specific clamping regions and mesh regions that change shape when stretched in a certain direction.
- The mask has a first clamping region, a second clamping region, and at least one mesh region between them.
- The mesh region changes shape when the mask is stretched, taking on a target shape different from its original form.
- The target shape can be a polygon, circle, or ellipse.
Key Features and Innovation
- Mask design with specific clamping and mesh regions.
- Mesh region changes shape when stretched.
- Target shape can be a polygon, circle, or ellipse.
Potential Applications
The technology could be used in various industries such as:
- Semiconductor manufacturing
- Display panel production
- Printed electronics
Problems Solved
- Provides a more precise and controlled method for shaping masks.
- Allows for customization of mask shapes for different applications.
- Improves the accuracy and efficiency of manufacturing processes.
Benefits
- Enhanced precision in mask manufacturing.
- Increased flexibility in design options.
- Improved quality and performance of end products.
Commercial Applications
- "Innovative Mask Design for Advanced Manufacturing Processes"
- Potential applications in semiconductor, display, and electronics industries.
- Market implications include improved production efficiency and product quality.
Prior Art
There may be prior art related to mask design and manufacturing processes in the semiconductor and display industries. Researchers can explore patents and publications in these fields for more information.
Frequently Updated Research
Stay updated on the latest advancements in mask design and manufacturing techniques in the semiconductor and display industries for potential improvements and innovations.
Questions about Mask Design
What are the key features of the mask described in the patent application?
The mask includes specific clamping regions and mesh regions that change shape when stretched, allowing for precise customization of mask shapes.
How can this technology benefit industries like semiconductor manufacturing and display panel production?
This technology can improve the accuracy and efficiency of manufacturing processes, leading to enhanced product quality and performance.
Original Abstract Submitted
A mask, a manufacturing method therefor, and a manufacturing method for a display substrate are provided. The mask includes: a first clamping region and a second clamping region, which are opposite to each other in a first direction, and at least one mesh region between the first clamping region and the second clamping region, the mesh region is in a first shape, in a case where the mask is stretched in the first direction, the mesh region is in a target shape, the target shape is different from the first shape, and the target shape includes a polygon shape, a circle shape, or an ellipse shape.
