18427992. STATE DETERMINATION METHOD AND COMPUTER-READABLE RECORDING MEDIUM simplified abstract (Tokyo Electron Limited)
Contents
- 1 STATE DETERMINATION METHOD AND COMPUTER-READABLE RECORDING MEDIUM
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 STATE DETERMINATION METHOD AND COMPUTER-READABLE RECORDING MEDIUM - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
STATE DETERMINATION METHOD AND COMPUTER-READABLE RECORDING MEDIUM
Organization Name
Inventor(s)
Junnosuke Maki of Koshi City (JP)
Mitsuteru Yano of Koshi City (JP)
Masato Hayashi of Koshi City (JP)
STATE DETERMINATION METHOD AND COMPUTER-READABLE RECORDING MEDIUM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18427992 titled 'STATE DETERMINATION METHOD AND COMPUTER-READABLE RECORDING MEDIUM
Simplified Explanation
The abstract describes a substrate processing apparatus with a functional component, a nozzle for gas flow, a flow rate sensor, and a controller for determining distances based on gas flow measurements.
- Functional component: Part of the substrate processing apparatus.
- Nozzle: Allows gas to pass through on the surface of the functional component.
- Nozzle flow path: Connected to the nozzle for gas flow.
- Flow rate sensor: Measures the flow rate of gas through the nozzle flow path.
- Controller: Makes determinations on distances based on measurements from the flow rate sensor.
Potential Applications
This technology could be applied in industries such as semiconductor manufacturing, where precise control of gas flow and distance measurements are crucial for substrate processing.
Problems Solved
This technology solves the problem of accurately determining the distance between an interfering object and the functional component of the substrate processing apparatus, which is essential for maintaining the quality and integrity of substrate processing.
Benefits
The benefits of this technology include improved accuracy in distance measurements, enhanced control over gas flow, and overall efficiency in substrate processing operations.
Potential Commercial Applications
Potential commercial applications of this technology include semiconductor fabrication facilities, research institutions, and any industry requiring precise substrate processing equipment.
Possible Prior Art
One possible prior art could be systems using proximity sensors for distance measurements in substrate processing equipment.
What is the accuracy of the distance measurements provided by the controller?
The accuracy of the distance measurements provided by the controller depends on the precision of the flow rate sensor and the calibration of the system.
How does the controller determine the state of the distance between the interfering object and the functional component?
The controller determines the state of the distance between the interfering object and the functional component based on the measurement results obtained by the flow rate sensor, which indicate the gas flow rate through the nozzle flow path.
Original Abstract Submitted
A substrate processing apparatus configured to process a substrate includes a functional component constituting a part of the substrate processing apparatus; a nozzle, provided on a surface of the functional component, allowing a gas to pass therethrough; a nozzle flow path which is connected to the nozzle of the functional component and through which the gas flows; a flow rate sensor configured to measure a flow rate of the gas flowing through the nozzle flow path; and a controller configured to make a determination upon a state of a distance between an interfering object and the functional component based on a measurement result obtained by the flow rate sensor.
