Jump to content

20250216431. Capacitance Meas (United Microelectronics .)

From WikiPatents
Revision as of 18:58, 3 July 2025 by Wikipatents (talk | contribs) (Automated patent report)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

CAPACITANCE MEASUREMENT METHOD FOR A CAPACITIVE DEVICE

Abstract: a capacitance measurement method for a capacitive device is provided. the method includes: providing a wafter, on which the capacitive device is formed, having a set of calibration test pads and a set of test pads; applying a test signal to the set of calibration test pads through a first test path to measure a first capacitance between two calibration test pads; applying the test signal to the set of test pads through a second test path to measure a second capacitance between two test pads; and obtaining a capacitance of the capacitive device by a difference between the first capacitance and the second capacitance.

Inventor(s): Pei Chieh Chiu, Shang-Lin Ying, Ching-Tsung Chen, Cheng-Shu Yeh, Kuang-Chuan Lee, Shing-Ren Sheu

CPC Classification: G01R27/2605 ({Measuring capacitance (capacitive sensors )})

Search for rejections for patent application number 20250216431


Cookies help us deliver our services. By using our services, you agree to our use of cookies.