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20250206985. Polishing Composition (FUJIMI INCORPORATED)

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POLISHING COMPOSITION

Abstract: polishing compositions and methods are provided which enable barrier polishing with tunable removal rate ratios for tantalum, cobalt, and copper.

Inventor(s): Anthony Y. KIM, Charles POUTASSE

CPC Classification: C09G1/02 (POLISHING COMPOSITIONS (French polish ); SKI WAXES)

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