Jump to content

20250185518. Method Manufacturing Spin-orbit Tor (COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES)

From WikiPatents
Revision as of 05:00, 11 June 2025 by Wikipatents (talk | contribs) (Automated patent report)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

METHOD FOR MANUFACTURING A SPIN-ORBIT TORQUE EFFECT MEMORY

Abstract: a method for manufacturing a spin-orbit torque effect memory, referred to as sot memory, which is simple to execute and which offers a memory with a switching efficiency at least equivalent to the sot memories of prior art. for this, the manufacturing method includes depositing a conductive layer, referred to as a spacer, onto a magnetic stack; etching the magnetic stack using the spacer as an etching mask so as to form a magnetic tunnel junction; and forming an sot track on the spacer.

Inventor(s): Bernard VIALA, Kévin GARELLO, Louis HUTIN, Bertrand DELAET, Marco BIAGI

CPC Classification: H10N50/10 (Magnetoresistive devices)

Search for rejections for patent application number 20250185518


Cookies help us deliver our services. By using our services, you agree to our use of cookies.