18054886. Self-Aligned Mask for Humidity Barrier Patterning simplified abstract (Microsoft Technology Licensing, LLC)
Contents
- 1 Self-Aligned Mask for Humidity Barrier Patterning
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 Self-Aligned Mask for Humidity Barrier Patterning - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 How does the piezoelectric material contribute to the functionality of the mirror assembly?
- 1.11 What types of protective films are commonly used in scanning devices, and how does the etching process effectively remove them from the mirror surface?
- 1.12 Original Abstract Submitted
Self-Aligned Mask for Humidity Barrier Patterning
Organization Name
Microsoft Technology Licensing, LLC
Inventor(s)
Xiao Chuan Ong of Seattle WA (US)
Seungwoo Lee of Redmond WA (US)
Wyatt Owen Davis of Bothell WA (US)
Self-Aligned Mask for Humidity Barrier Patterning - A simplified explanation of the abstract
This abstract first appeared for US patent application 18054886 titled 'Self-Aligned Mask for Humidity Barrier Patterning
Simplified Explanation
The method involves forming a mirror assembly for a scanning device with a mirror supported by flexible beams and encased with a cover having a scanning opening aligned with the mirror. The interior of the scanning assembly is coated with a protective film, which is removed from the top of the mirror through etching.
- Mirror assembly for scanning device
- Mirror rotationally supported by flexible beams
- Piezoelectric material included in the mirror assembly
- Cover with top scanning opening aligned with the mirror
- Protective film coating the interior of the scanning assembly
- Etching performed through the top scanning opening to remove the protective film from the top of the mirror
Potential Applications
This technology could be used in:
- Laser scanning devices
- Medical imaging equipment
- Industrial inspection systems
Problems Solved
- Protection of the mirror surface
- Precision scanning without interference
- Longevity of the scanning device
Benefits
- Improved scanning accuracy
- Longer lifespan of the scanning device
- Enhanced performance in various applications
Potential Commercial Applications
Optimizing Mirror Assembly for Scanning Devices: Improving Performance and Longevity
Possible Prior Art
There may be prior art related to mirror assemblies for scanning devices, but specific examples are not provided in this abstract.
Unanswered Questions
How does the piezoelectric material contribute to the functionality of the mirror assembly?
The abstract mentions the inclusion of piezoelectric material in the mirror assembly, but it does not elaborate on its specific role or benefits. Further details on this aspect would provide a more comprehensive understanding of the innovation.
What types of protective films are commonly used in scanning devices, and how does the etching process effectively remove them from the mirror surface?
While the abstract mentions the presence of a protective film on the mirror surface and its removal through etching, it does not specify the types of protective films typically used in scanning devices or the exact mechanism of the etching process. More information on these aspects would enhance the clarity of the patent application.
Original Abstract Submitted
A method includes forming a mirror assembly for a scanning device that includes a mirror rotationally supported by flexible beams, the mirror assembly also including a piezoelectric material. The mirror is encased with a cover having a top scanning opening aligned with the mirror to form a scanning assembly. An interior of the scanning assembly is coated with a protective film. Etching is performed through the top scanning opening to remove the protective film from a top of the mirror.
