18421644. INTEGRATED CIRCUIT LAYOUT GENERATION METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

INTEGRATED CIRCUIT LAYOUT GENERATION METHOD

Organization Name

Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor(s)

Ke-Ying Su of Hsinchu (TW)

Jon-Hsu Ho of Hsinchu (TW)

Ke-Wei Su of Hsinchu (TW)

Liang-Yi Chen of Hsinchu (TW)

Wen-Hsing Hsieh of Hsinchu (TW)

Wen-Koi Lai of Hsinchu (TW)

Keng-Hua Kuo of Hsinchu (TW)

KuoPei Lu of Hsinchu (TW)

Lester Chang of Hsinchu (TW)

Ze-Ming Wu of Hsinchu (TW)

INTEGRATED CIRCUIT LAYOUT GENERATION METHOD - A simplified explanation of the abstract

This abstract first appeared for US patent application 18421644 titled 'INTEGRATED CIRCUIT LAYOUT GENERATION METHOD

Simplified Explanation

The abstract describes a method for generating an IC layout diagram by analyzing gate resistance values and determining compliance with design specifications.

• Receiving an IC layout diagram with a gate region and gate via
• Gate via positioned within an active region along the width of the gate region
• Retrieving gate resistance values and determining non-compliance with design specifications
• Modifying the IC layout diagram based on non-compliance

Potential Applications

This technology could be applied in the semiconductor industry for optimizing IC layout designs to meet specific performance requirements.

Problems Solved

This technology helps identify and rectify layout issues related to gate resistance values, ensuring the IC design meets desired specifications.

Benefits

- Improved efficiency in IC layout design process - Enhanced performance and reliability of integrated circuits - Cost savings by reducing the need for extensive redesigns

Potential Commercial Applications

Optimizing IC layout designs for various electronic devices, such as smartphones, computers, and automotive systems.

Possible Prior Art

One possible prior art could be the use of simulation software to analyze IC layout designs for compliance with design specifications.

What are the limitations of this technology in real-world applications?

The abstract does not mention the scalability of this method for large-scale IC layouts or the computational resources required for analyzing complex designs.

How does this technology compare to existing methods for IC layout optimization?

The abstract does not provide a comparison with existing methods or tools commonly used in the semiconductor industry for IC layout optimization.

Original Abstract Submitted

A method of generating an IC layout diagram includes receiving an IC layout diagram including a gate region and a gate via, the gate via being positioned at a location within an active region and along a width of the gate region extending across the active region, receiving a first gate resistance value of the gate region, retrieving a second gate resistance value from a resistance value reference based on the location and the width, using the first and second resistance values to determine that the IC layout diagram does not comply with a design specification, and based on the non-compliance with the design specification, modifying the IC layout diagram.