18407349. MASK, MASK ASSEMBLY, AND APPARATUS FOR MANUFACTURING DISPLAY APPARATUS simplified abstract (SAMSUNG DISPLAY CO., LTD.)
Contents
- 1 MASK, MASK ASSEMBLY, AND APPARATUS FOR MANUFACTURING DISPLAY APPARATUS
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 MASK, MASK ASSEMBLY, AND APPARATUS FOR MANUFACTURING DISPLAY APPARATUS - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
MASK, MASK ASSEMBLY, AND APPARATUS FOR MANUFACTURING DISPLAY APPARATUS
Organization Name
Inventor(s)
MASK, MASK ASSEMBLY, AND APPARATUS FOR MANUFACTURING DISPLAY APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18407349 titled 'MASK, MASK ASSEMBLY, AND APPARATUS FOR MANUFACTURING DISPLAY APPARATUS
Simplified Explanation
The patent application describes a mask with a deposition pattern portion and a dummy pattern portion with an auxetic structure.
- The mask includes a deposition pattern portion with deposition holes for material to pass through.
- The dummy pattern portion outside the deposition pattern portion has an auxetic structure with a negative Poisson's ratio.
Potential Applications
The technology could be used in:
- Semiconductor manufacturing
- 3D printing
Problems Solved
This technology addresses issues such as:
- Improving material deposition accuracy
- Enhancing mask durability
Benefits
The benefits of this technology include:
- Increased efficiency in material deposition processes
- Enhanced precision in pattern formation
Potential Commercial Applications
Aerospace Industry: Optimizing material deposition processes Medical Field: Improving precision in manufacturing medical devices
Possible Prior Art
There may be prior art related to:
- Masks with deposition patterns
- Auxetic structures in manufacturing processes
Unanswered Questions
How does the auxetic structure impact the overall performance of the mask?
The auxetic structure could potentially affect the flexibility and durability of the mask, but further testing and analysis would be needed to determine the exact impact.
Are there any limitations to the size or shape of the deposition pattern portion?
It is unclear from the abstract whether there are restrictions on the size or shape of the deposition pattern portion, which could impact its applicability in different manufacturing processes.
Original Abstract Submitted
A mask including: a deposition pattern portion including a plurality of deposition holes that are configured to have deposition material pass therethrough; and a dummy pattern portion outside the deposition pattern portion, wherein the dummy pattern portion includes an auxetic structure having a negative Poisson's ratio.
