Samsung electronics co., ltd. (20250147419). RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME

RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME

Organization Name

samsung electronics co., ltd.

Inventor(s)

Jungha Chae of Suwon-si KR

Haengdeog Koh of Suwon-si KR

Yoonhyun Kwak of Suwon-si KR

Mijeong Kim of Suwon-si KR

Sunyoung Lee of Suwon-si KR

Jiyoun Lee of Suwon-si KR

Changheon Lee of Suwon-si KR

Jinwon Jeon of Suwon-si KR

RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME

This abstract first appeared for US patent application 20250147419 titled 'RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME