Samsung electronics co., ltd. (20250147419). RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME
RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME
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RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME
This abstract first appeared for US patent application 20250147419 titled 'RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME
Original Abstract Submitted
provided are a resist composition and a pattern formation method using the same, the resist composition including a first organometallic compound represented by one of formulae 1-1 to 1-4 and a second organometallic compound represented by formula 2:
