Samsung electronics co., ltd. (20250147415). RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME
RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME
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RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME
This abstract first appeared for US patent application 20250147415 titled 'RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME
Original Abstract Submitted
provided are a resist composition and a pattern formation method using the same. the resist composition may include an organometallic compound represented by one of formulae 1-1 to 1-4, and an additive represented by formula 2: