Samsung display co., ltd. (20240130201). DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME simplified abstract

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DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME

Organization Name

samsung display co., ltd.

Inventor(s)

Euikang Heo of Yongin-si (KR)

DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240130201 titled 'DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME

Simplified Explanation

The method described in the patent application involves cleaning a substrate surface with an etchant containing fluorine or hydrofluoric acid, and then forming a bottom metal layer on the substrate surface. The bottom metal layer consists of a first layer and a second layer, with the surface roughness of the substrate increasing after cleaning compared to before cleaning.

  • Cleaning substrate surface with etchant containing fluorine or hydrofluoric acid
  • Forming bottom metal layer with first and second layers
  • Increased surface roughness of substrate after cleaning

Potential Applications

The technology described in this patent application could be applied in the manufacturing of display apparatus, such as LCD screens, OLED displays, or touchscreens.

Problems Solved

This technology helps in improving the adhesion and performance of the bottom metal layer on the substrate surface by increasing the surface roughness, which can lead to better overall display quality and longevity.

Benefits

The benefits of this technology include enhanced adhesion of the metal layer, improved display performance, and potentially longer lifespan of the display apparatus.

Potential Commercial Applications

One potential commercial application of this technology could be in the production of high-quality display screens for electronic devices, such as smartphones, tablets, and televisions.

Possible Prior Art

One possible prior art for this technology could be the use of similar etching and metal layer formation processes in the manufacturing of semiconductor devices.

Unanswered Questions

How does the increased surface roughness affect the overall performance of the display apparatus?

The article does not provide specific details on how the increased surface roughness impacts the functionality and quality of the display.

Are there any potential drawbacks or limitations to using this method in manufacturing display apparatus?

The article does not mention any potential drawbacks or limitations that may arise from implementing this method in the production of display screens.


Original Abstract Submitted

a method of manufacturing a display apparatus is provided, the method including cleaning a surface of a substrate with an etchant containing fluorine (f) or a chemical solution of hydrofluoric acid (hf), and forming a bottom metal layer on the surface of the substrate, the bottom metal layer including a first layer and a second layer on the first layer, wherein a surface roughness of the substrate after cleaning is greater than a surface roughness of the substrate before cleaning.