Samsung electronics co., ltd. (20250147423). PHOTOLITHOGRAPHIC RINSE COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITIONS
PHOTOLITHOGRAPHIC RINSE COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITIONS
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PHOTOLITHOGRAPHIC RINSE COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITIONS
This abstract first appeared for US patent application 20250147423 titled 'PHOTOLITHOGRAPHIC RINSE COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITIONS
Original Abstract Submitted
disclosed are photolithographic rinse compositions and methods of forming patterns using the same, the photolithographic rinse compositions including a gemini-type surfactant having a main chain including at least two hydrophobic groups and at least one hydrophilic group and at least two side chains branching from the main chain and including a hydrophilic group-including functional group, and a solvent.
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