Samsung electronics co., ltd. (20240134290). MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract

MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS

Organization Name

samsung electronics co., ltd.

Inventor(s)

Inbeom Yim of Suwon-si (KR)

Junseong Yoon of Suwon-si (KR)

Seungyoon Lee of Suwon-si (KR)

Jeongjin Lee of Suwon-si (KR)

Chan Hwang of Suwon-si (KR)

MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240134290 titled 'MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS

Simplified Explanation

The method described in the patent application involves selecting multi-wavelengths for overlay measurement in semiconductor device manufacturing. This method includes measuring overlay at multiple positions on a wafer at different wavelengths within a set range, selecting representative wavelengths that simulate the overlay, and allocating weights to these representative wavelengths.

• Explanation of the patent:

 * Method for selecting multi-wavelengths for overlay measurement in semiconductor device manufacturing.
 * Involves measuring overlay at multiple positions on a wafer at different wavelengths within a set range.
 * Selecting representative wavelengths that simulate the overlay.
 * Allocating weights to the representative wavelengths.

Potential Applications

The technology described in the patent application could be applied in various industries such as semiconductor manufacturing, electronics, and nanotechnology for accurate overlay measurements.

Problems Solved

This technology solves the problem of accurately measuring overlay in semiconductor device manufacturing, which is crucial for ensuring the quality and performance of the final product.

Benefits

The benefits of this technology include improved accuracy in overlay measurements, enhanced quality control in semiconductor manufacturing processes, and ultimately, higher quality and more reliable semiconductor devices.

Potential Commercial Applications

The potential commercial applications of this technology include semiconductor manufacturing equipment, overlay measurement tools, and quality control systems for the semiconductor industry.

Possible Prior Art

One possible prior art related to this technology could be existing methods for overlay measurement in semiconductor manufacturing, which may not be as accurate or efficient as the method described in the patent application.

How does this technology compare to existing methods for overlay measurement in semiconductor manufacturing?

The patent application does not provide a direct comparison to existing methods for overlay measurement. Further research or testing would be needed to determine the advantages and limitations of this technology compared to current practices.

What are the specific industries or applications outside of semiconductor manufacturing where this technology could be beneficial?

The patent application focuses on semiconductor device manufacturing, but it is unclear if this technology could be applied in other industries such as optics, telecommunications, or medical devices. Additional research and testing would be required to explore these potential applications.

Original Abstract Submitted

provided are a method of selecting multi-wavelengths for overlay measurement, for accurately measuring overlay, and an overlay measurement method and a semiconductor device manufacturing method using the multi-wavelengths. the method of selecting multi-wavelengths for overlay measurement includes measuring an overlay at multiple positions on a wafer at each of a plurality of wavelengths within a set first wavelength range, selecting representative wavelengths that simulate the overlay of the plurality of wavelengths, from among the plurality of wavelengths, and allocating weights to the representative wavelengths, respectively.