18907139. REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK BLANK (Shin-Etsu Chemical Co., Ltd.)

REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK BLANK

Organization Name

Shin-Etsu Chemical Co., Ltd.

Inventor(s)

Taiga Ogose of Niigata JP

Yukio Inazuki of Niigata JP

Hideo Kaneko of Niigata JP

Takuro Kosaka of Niigata JP

REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK BLANK

This abstract first appeared for US patent application 18907139 titled 'REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK BLANK

Original Abstract Submitted

A reflective photomask blank has a substrate and a multilayer reflective film The multilayer reflective film has a periodic stacked structure in which a low refractive index layer containing ruthenium (Ru), a high refractive index layer containing silicon (Si), and a diffusion prevention layer The diffusion prevention layer is formed in contact with the low refractive index layer on both or one of a side of the low refractive index layer close to the substrate and a side of the low refractive index layer away from the substrate The diffusion prevention layer is one or more sublayers selected from a layer containing a silicon nitride (SiN), a layer containing silicon carbide (Sic), a layer containing molybdenum (Mo), a layer containing a molybdenum nitride (MoN), and a layer containing molybdenum carbide (MoC).