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18403247. DUAL CHANNEL SHOWERHEAD CONDUCTANCE OPTIMIZATION FOR UNIFORM RADIAL FLOW DISTRIBUTION (Applied Materials, Inc.)

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DUAL CHANNEL SHOWERHEAD CONDUCTANCE OPTIMIZATION FOR UNIFORM RADIAL FLOW DISTRIBUTION

Organization Name

Applied Materials, Inc.

Inventor(s)

Barath Kumar of Puducherry IN

Neela Ayalasomayajula of Bengaluru IN

Sumesh Suresh of Bangalore IN

Pratik Pande of Bangalore IN

DUAL CHANNEL SHOWERHEAD CONDUCTANCE OPTIMIZATION FOR UNIFORM RADIAL FLOW DISTRIBUTION

This abstract first appeared for US patent application 18403247 titled 'DUAL CHANNEL SHOWERHEAD CONDUCTANCE OPTIMIZATION FOR UNIFORM RADIAL FLOW DISTRIBUTION

Original Abstract Submitted

A dual-channel showerhead may include a first plate defining two or more channels and a second plate including a bottom surface and defining a plurality of apertures. Each of the two or more channels may be fluidly coupled with one of the plurality of apertures to define a fluid path extending from the first plate through the bottom surface. The plurality of apertures may be arranged in a series of rings. A first subset of apertures of the plurality of apertures may extend through the first plate and the bottom surface. A second subset of apertures in a first ring of the series of rings may include a first opening area. Each aperture of the second subset in a second ring may include a second opening area smaller than the first opening area, such that a flow conductance of the first ring is within 5% of the second ring.

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